Asml Netherlands B.v.

Franciscus Van De Mast

Engelbertus Antonius Fransiscus Van Der Pasch

Jan Steven Christiaan Westerlaken

Peter Paul Steijaert

Gerardus Arnoldus Hendricus Franciscus Janssen

Johannes Onvlee

Reinder Teun Plug

Johan Christiaan Gerard Hoefnagels

Joost Jeroen Ottens

Koen Jacobus Johannes Maria Zaal

Judocus Marie Dominicus Stoeldraijer

Antonius Johannes De Kort

Marteijn De Jong

Jan Westerklaren

Engelbertus Van Der Pasch

Gerardus Janssen

Peter Steijaert

A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

Lithographic apparatus and device manufacturing method

A method of updating calibration data of a first position detection system adapted to determine the position of an object, is presented. The first position detection system includes a target and a plurality of sensors one of which is mounted on an object and the calibration data including coefficients relating an apparent measured position to an actual position and which can be used to convert an apparent measured position to an actual position thereby to correct for physical imperfections in the first position detection system and enable determination of the actual position from the apparent measured position.

Method of updating calibration data and a device manufacturing method

A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.

Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method

A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.

Lithography system, control system and device manufacturing method

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Eindhoven, Netherlands

Franciscus Van De Mast