Kla Tencor Corporation

Kla Corporation

Francisco Kole

Yung-Ho Alex Chuang

John Fielden

Sisir Yalamanchili

Greg Kirk

Johannes G M Christiaanse

Winfred Tee Chow

Johannes GM Christiaanse

Gregory L Kirk

Back-illuminated DUV/VUV/EUV radiation or charged particle image sensors are fabricated using a method that utilizes a plasma atomic layer deposition (plasma ALD) process to generate a thin pinhole-free pure boron layer over active sensor areas. Circuit elements are formed on a semiconductor membrane's frontside surface, and then an optional preliminary hydrogen plasma cleaning process is performed on the membrane's backside surface. The plasma ALD process includes performing multiple plasma ALD cycles, with each cycle including forming an adsorbed boron precursor layer during a first cycle phase, and then generating a hydrogen plasma to convert the precursor layer into an associated boron nanolayer during a second cycle phase. Gasses are purged from the plasma ALD process chamber after each cycle phase. The plasma ALD cycles are repeated until the resulting stack of boron nanolayers has a cumulative stack height (thickness) that is equal to a selected target thickness.

Back-illuminated sensor with boron layer deposited using plasma atomic layer deposition

In certain embodiments, a method for validating the human visual inspection process or an optical analysis instrument for use with biological particles may include inspecting a standard particle solution using the optical analysis instrument. The standard particle solution may include a known concentration of standard particles suspended in solution with the standard particles having a defined size and shape distribution. The standard particles may have a refractive index that is substantially similar to a refractive index of the biological particles. The method may include assessing a concentration of standard particles in the standard particle solution from the inspection. The method may include assessing a difference between the assessed concentration of standard particles and the known concentration of standard particles. The method may include modifying one or more parameters of the optical analysis instrument based on the assessed difference between the concentrations. The method may include assessing a detection efficiency of the optical analysis instrument.

Particle suspensions used as low-contrast standards for inspection of liquids

Growing community of inventors

San Jose, CA, United States of America

Francisco Kole