Ashland, Inc.

Other

J. T. Baker Chemical Company

Advanced Scientific Concepts, Inc.

Act, Inc.

Concept Sciences, Inc.

Ashland Oil Company

Francis W Michelotti

Irl E Ward

Darryl W Peters

James W Seidenberger

Floyd L Riddle

Leslie D Molnar

An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.

Aqueous stripping and cleaning compositions

An aqueous stripping composition comprising a mixture of a polar amine, an organic or inorganic amine and a corrosion inhibitor which is gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.

An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of a polar amine solvent, about 22.5 to 15% by weight of a basic amine, especially hydroxylamine, a corrosion inhibitor and water. The stripping composition is effective for stripping photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures.

Aqueous stripping and cleaning compositions containing hydroxylamine and

The invention provides a method for purification of hydroxylamine so as to have a substantial reduction of cations and anions. The method involves passing a solution of hydroxylamine through at least one strong acid ion exchange bed which has been pretreated with dilute hydrochloric acid and then through at least one strong base anion exchange resin bed which has been pretreated or regenerated with a non-metal amino or hydroxide base solution.

Purification of hydroxylamine

Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

Organic stripping composition

A non-aqueous negative photoresist stripping composition which consists essentially of about 40 to 80% by weight of an alkylnaphthalene solvent, about 5 to 20% by weight of an alkyl phenol which provides a corrosion inhibitory effect, about 5 to 20% by weight of a linear monoalkylbenzene sulfonic acid which is a surfactant and about 1 to 10% by weight of a dialkylbenzene sulfonic acid. There is further provided a process for removing coatings from a photoresist with the compositions of the invention.

Photoresist stripping compositions

An aqueous and basic stripping and cleaning composition is provided which contains a hydroxylamine, ammonium fluoride, water and optionally DMSO. The pH of the composition is greater than about 8. Also provided is a method of stripping and cleaning utilizing the compositions of the invention.

Basic stripping and cleaning composition

An aqueous and acidic stripping and cleaning composition is provided which contains a polyhydric alcohol, ammonium fluoride, dimethylsulfoxide and water. The pH of the composition is greater than about 4 but less than 7. Also provided is a method of stripping and cleaning utilizing the compositions of the invention. Optionally, the composition may contain a phosphate buffer.

Stripping and cleaning composition

A stripping and cleaning composition is provided which contains a polyhydric alcohol, fluoboric acid, a fluorine containing compound and a polar solvent. The pH of the composition is less than 5. Also provided is a method of stripping and cleaning utilizing the compositions of the invention.

Method of stripping photoresist with composition containing inhibitor

An alkaline positive and negative resist stripping composition having low volatility and operable at temperatures less than about 90.degree. C. which comprises,

Alkaline stripping compositions

A non-aqueous biodegradable negative photoresist stripping composition having low toxicity and is operable at temperatures at 85.degree. C. or less which comprises about 85% by weight of an aromatic hydrocarbon solvent of the formula selected from the group consisting of: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each is a member selected from the group consisting of methyl, ethyl n-propyl and isopropyl, and an organic sulfonic acid of the formula:

A spill of acid is controlled and cleaned up by being neutralized by a low metal ion fluid neutralizer composition formed of a non-volatile organic amine compound, a foam-forming surfactant and a pH indicator dye and which can additionally contain water, a dissolved gas and color tinting agents. Such a neutralizer composition is especially useful in the electronics manufacturing industry and in clean rooms where the presence of metal ions would be deleterious.

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Easton, PA, United States of America

Francis W Michelotti