International Business Machines Corporation

Francis Emmi

Frank Daniel Egitto

William E Bernier

Robin A Susko

Robert J Twieg

Edmond Otto Fey

Walter E Mlynko

Paul L Gendler

Contaminant is removed from holes by etching in a gaseous plasma by first removing contaminant from the vicinity of the edges of the hole. Next, a mask is provided in the vicinity of the edges to prevent etching by contacting with a gaseous plasma which is different from the gaseous plasma employed in the first etching step. The holes are then etched in a gaseous plasma to remove contaminant from the interior of the holes in the vicinity of the center of the holes, whereby the mask protects the edges from being etched.

Process for removing contaminant

An electrochromic printable medium which includes a substrate coated with certain organic compounds and with the reduced form of an oxidizing agent; and use thereof for electrochromic printing.

Electrochromic printing

Growing community of inventors

Binghamton, NY, United States of America

Francis Emmi