L'air Liquide, Soci&#xe9;t&#xe9; Anonyme Pour L'etude Et L'exploitation Des Proc&#xe9;d&#xe9;s Georges Claude

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Fran&ccedil;ois Coeuret

Panayotis Cocolios

Alain Villermet

Jean-Christophe Rostaing

Eckhard Prinz

Bernd Martens

Michel Moisan

Claude Doche

Jean-Louis Gelot

Philippe Spinelli

St&eacute;phane Melen

Claude De Saint Etienne

Michel Inizan

Wolfgang D&ouml;ring

Jean-Yves Thonnelier

Franck F&ouml;rster

J&uuml;rgen Salge

Sylvain Scotto D'Apolinia

Optimization of an installation in which an operation is performed that requires control over the atmosphere inside a chamber ( ), the operation being performed in the presence of a gaseous mixture capable of giving off emissions, the optimization being obtained by the presence of inlet ( ) and outlet ( ) devices external to the chamber to oppose the ingress of air into the chamber and the exit of gaseous emissions; and of an extraction device ( ) comprising means ( ) for regulating the flow rate to maintain an approximately zero pressure differential between the inside and the outside of the chamber.

Installation in which an operation is performed requiring over the atmosphere inside a chamber

A process for the surface treatment of a running substrate by an electrical discharge created between two roller electrodes, comprising a first roller electrode and a second roller electrode, in a gas mixture comprising the steps of passing the substrate in between the two roller electrodes by applying it against the first roller electrode; injecting the gas mixture between the rollers to apply a first surface treatment to the substrate; passing the substrate in between the two roller electrodes by applying it against a second roller electrode; and injecting the gas mixture between the rollers to apply a second surface treatment to the substrate.

Process and device for the surface treatment of a substrate by an electrical discharge between two electrodes in a gas mixture

An apparatus for the treatment of perfluorinated and/or hydrofluorocarbon gases, for the purpose of destroying them, is provided. The apparatus includes at least one high-frequency surface-wave exciter which produces surface waves, a waveguide designed to guide the surface waves produced by the at least one wave exciter to at least one hollow dielectric tube for (i) creating, when supplied with a carrier gas an atmospheric-pressure plasma and (ii) for dissociating the molecules of the perfluorinated and/or hydrofluorocarbon gases within the plasma in order to form reactive compounds, and at least one treatment unit for the reactive fluorinated compounds which is arranged on an exit side of a corresponding hollow dielectric tube.

Process and apparatus for the treatment of perfluorinated and hydrofluorocarbon gases for the purpose of destroying them

The invention relates to a storage box for an object that is to be protected from physicochemical contamination. The storage box is intended to have low weight, good mechanical strength, a good electrical condition, with a low degassing rate in time with prevention of diffusion of gasses from the external atmosphere into the interior of the box. The inner and/or outer surface of the box's walls are coated with at least one protective layer. The box may be used to store silicon wafers.

Storage box for an object to be protected against physicochemical contamination

Process and plant for the production of a gaseous mixture containing a carrier gas an oxidizing gas and a silane

Growing community of inventors

Guyancourt, France

François Coeuret

Growing community of inventors

Guyancourt, France

Fran&ccedil;ois Coeuret

François Coeuret