Carl Zeiss Smt Gmbh

Florian Herold

Holger Kierey

Arno Schmittner

Michael Erath

Wolfgang Merkel

Georgo Metalidis

Ralf Moser

Philipp Gaida

A projection exposure apparatus has a vibration damper with a holder and a mass that is connected to the holder via a damping element. The vibration damper comprises a temperature control device for the temperature control of the damping element. The disclosure also relates to a method for designing a vibration damper.

Projection exposure apparatus for semiconductor lithography with a vibration damper and method for designing a vibration damper

The disclosure relates to an optical element, in particular for a microlithographic projection exposure apparatus. The optical element has an optical effective surface. The optical element includes a substrate, a layer system that is present on the substrate, and a protective cover extending over an edge region of the optical element that is adjacent to the optical effective surface. During operation of the optical element, the protective coating reduces an ingress of hydrogen radicals into the layer system in comparison with an analogous design without the protective cover, wherein a gap is formed between the protective cover and the layer system.

Optical element, in particular for a microlithographic projection exposure apparatus

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Aalen, Germany

Florian Herold