Asml Netherlands B.v.

Florian Didier Albin Dhalluin

Luigi Scaccabarozzi

Vadim Yevgenyevich Banine

Pieter-Jan Van Zwol

Mária Péter

Jozef Petrus Henricus Benschop

Willem Joan Van Der Zande

Andrei Mikhailovich Yakunin

Andrey Alexandrovich Nikipelov

James Norman Wiley

Derk Servatius Gertruda Brouns

Laurentius Cornelius De Winter

Arjen Boogaard

Alexey Sergeevich Kuznetsov

Juan Diego Arias Espinoza

Pedro Julian Rizo Diago

Mária PÉTER

A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 10cm, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.

Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane

A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 10cm, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.

The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

Lithographic apparatus

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Eindhoven, Netherlands

Florian Didier Albin Dhalluin