Asml Netherlands B.v.

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Fidelus Adrianus Boon

Olof Martinus Josephus Fischer

Sven Antoin Johan Hol

Edwin Johan Buis

Gosse Charles De Vries

Hendrikus Pascal Gerardus Johannes Van Agtmaal

Jan Bernard Plechelmus Van Schoot

Marinus Johannes Maria Van Dam

Hermanus Johannes Maria Kreuwel

Peter Michel Silvester Maria Heijmans

Abdelhamid Kechroud

Hendrikus Van Agtmaal

A Lorentz actuator includes: a magnet arrangement; a coil arrangement; and a current controller for supplying a current to the coil arrangement; wherein the magnet and coil arrangement are moveable relative to each other in a main direction, wherein the coil arrangement has a first and second coil portion that are separately operable by the current controller, such that when the same current is supplied to the first coil portion as is supplied to the second coil portion, Lorentz forces generated in the main direction by the first and second coil portions are also the same, and wherein the current controller is configured to supply a current to the first and second coil portions with a phase difference in order to compensate for parasitic reluctance and/or Lorentz forces in an auxiliary direction perpendicular to the main direction.

Lorentz actuator, object positioning system, lithographic apparatus and Lorentz actuator operating method

A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element.

Support for a movable element and lithography apparatus

A magnetic device includes first and second parts, a first magnetic part, with a first magnetic polarization, coupled to the first part, a second magnetic part, with a second magnetic polarization, coupled to the second part and an additional magnetic part coupled to the first part and having an additional magnetic polarization. The first and second magnetic parts magnetically interact with each other. The first magnetic part exerts a first force on the second magnetic part, the second magnetic part exerts a second force on the first magnetic part and the first and second forces have opposite directions that are parallel to a reference direction. The first magnetic polarization is substantially parallel to the reference direction, the second magnetic polarization is substantially perpendicular to the reference direction, the additional magnetic polarization makes an angle with the first magnetic polarization and has a magnitude in a range of about 90&#xb0;-270&#xb0;.

Magnetic device and lithographic apparatus

A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first outer subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second outer subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the second direction is substantially zero.

Lithographic apparatus and lorentz actuator

An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.

Illumination system, lithographic apparatus and method of adjusting an illumination mode

An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor such that operation of the motor will cause the second magnet to move. The second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move.

Optical apparatus, and method of orienting a reflective element

A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between at least a part of the first subsidiary magnet system and at least a part of the second subsidiary magnet system is smaller than the minimum distance between the first main magnet system and the second main magnet system.

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Bavel, Netherlands

Fidelus Adrianus Boon