Meta Platforms Technologies, LLC

University of Massachusetts

Feyza Dundar Arisoy

Matthew E Colburn

Ankit Vora

James J Watkins

Keren Zhang

Irene R Howell

Vincent Einck

Igor Abramson

A method of planarizing an overcoat layer on a surface-relief grating includes dispensing a layer of a resin material that is curable by heat or electromagnetic radiation on a surface-relief grating that includes a plurality of grating grooves, pressing the layer of the resin material using a planar imprint stamp, curing the resin material in the layer of the resin material, and detaching the planar imprint stamp from the layer of the resin material. In one example, a thickness of the overcoat layer on top of grating ridges of the surface-relief grating is equal to or less than 20 nm, and a surface peak-to-valley height of a top surface of the overcoat layer is equal to or less than 5 nm.

Techniques for controlling overburden planarization

Various examples disclosed relate to a method of manufacturing a mechanically stabilized material that includes a nanostructure. The method includes providing a curable material disposed on a substrate. The curable material includes inorganic nanoparticles. The method further includes exposing the curable material and the substrate to pulsed electromagnetic radiation to form the mechanically stabilized material.

Thermal imprinting of nanostructure materials

Growing community of inventors

Redmond, WA, United States of America

Feyza Dundar Arisoy