Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Philips Lighting Holding B.v.

Ferry Zijp

Duygu Akbulut

Sietse Thijmen Van Der Post

Peter Danny Van Voorst

Arie Jeffrey Den Boef

Nitesh Pandey

Koos Van Berkel

Marinus Petrus Reijnders

Jeroen Johan Maarten Van De Wijdeven

Hans Butler

Engelbertus Antonius Fransiscus Van Der Pasch

Hugo Augustinus Joseph Cramer

Coen Adrianus Verschuren

Teunis Willem Tukker

Sander Bas Roobol

Marinus Johannes Maria Van Dam

Jeroen Arnoldus Leonardus Johannes Raaymakers

Maarten Marinus Johannes Wilhelmus Van Herpen

Han-Kwang Nienhuys

Sarathi Roy

Jacobus Maria Antonius Van Den Eerenbeemd

Nitish Kumar

Stefan Michael Bruno Bäumer

Adrianus Johannes Hendrikus Schellekens

Willem Maria Julia Marcel Coene

Fanhe Kong

Maarten M J W Van Herpen

Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.

Detection apparatus for simultaneous acquisition of multiple diverse images of an object

A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

Metrology apparatus

A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel;

Reflector and method of manufacturing a reflector

An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

Method and apparatus for deriving corrections, method and apparatus for determining a property of a structure, device manufacturing method

A metrology tool, an aplanatic singlet lens, and a method of designing an aplanatic singlet lens are provided. The metrology tool is for determining a characteristic of a structure on a substrate. The metrology tool comprises an optical detection system for detecting radiation over a wavelength range. The optical detection system comprises an aplanatic singlet lens for focusing the radiation on to a detector. The aplanatic singlet lens has a n aplanatic wavelength which is within the wavelength range.

Metrology tools comprising aplanatic objective singlet

Some embodiment describe a reflector comprising a hollow body having an interior surface defining a passage. The interior surface has an optical surface part configured to reflect radiation and a supporter surface part. The optical surface part has a predetermined optical power and the supporter surface part does not. The reflector can be made by providing an axially symmetric mandrel, shaping a part of the circumferential surface of the mandrel to form an inverse optical surface part that is not rotationally symmetric about the axis of the mandrel, forming a reflector body around the mandrel and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.

An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.

Optical systems, metrology apparatus and associated method

A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

Method and apparatus for inspection and metrology

A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

A method including obtaining a plurality of radiation distributions of measurement radiation redirected by the target, each of the plurality of radiation distributions obtained at a different gap distance between the target and an optical element of a measurement apparatus, the optical element being the nearest optical element to the target used to provide the measurement radiation to the target, and determining a parameter related to the target using data of the plurality of radiation distributions in conjunction with a mathematical model describing the measurement target.

A method and apparatus for position control of a component relative to a surface is disclosed. The method may include calculating an estimated effect of, or derived from, Casimir force acting between the component and the surface, and compensating positioning of the component relative to the surface using the estimated effect.

A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.

The invention relates to an illumination system comprising a light emitting device and a beam shaping element for generating an angular distribution of the light emitted from the illumination system. The beam shaping element is configured for recycling at least a part of the light emitted from a light emitting surface of the light emitting device via reflection back towards the light emitting surface. The illumination system further comprises a diffuser arranged substantially parallel to the light emitting surface for diffusing at least part of the recycled light. The diffuser is constituted of a translucent diffuser and/or a diffusely reflective electrode layer of the light emitting device. Limiting the angular distribution by recycling light, using the beam shaping element for recycling light via reflection, reduces glare when the illumination system is used in general lighting applications. The diffuser avoids that the recycled light is confined between the beam shaping element and the light emitting surface of the light emitting element. The recycling is preferably done via total internal reflection at the beam shaping element. The presence of the diffuser improves the efficiency of the illumination system.

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Nuenen, Netherlands

Ferry Zijp