Asml Netherlands B.v.

Ferdy Migchelbrink

Marcel Beckers

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Nicolaas Rudolf Kemper

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Elmar Evers

Erik Henricus Egidius Catharina Eummelen

Giovanni Luca Gattobigio

Gheorghe Tanasa

Miao Yu

Petrus Martinus Gerardus Johannes Arts

Sergei Shulepov

Stefan Philip Christiaan Belfroid

Jimmy Matheus Wilhelmus Van De Winkel

Arnoldus Johannes Martinus Jozeph Ras

Daan Daniel Johannes Antonius Van Sommeren

Jeroen Arnoldus Leonardus Johannes Raaymakers

Harold Sebastiaan Buddenberg

Zhuangxiong Huang

Floor Lodewijk Keukens

Marijn Wouters

José Nilton Fonseca Junior

Franciscus Johannes Leonardus Heutz

Seerwan Saeed

Wilhelmus Josephus Box

Theodorus Wilhelmus Polet

Bernardus Antonius Johannes Luttikhuis

Han Henricus Aldegonda Lempens

Jan Jaap Kuit

Carlo Cornelis Maria Luijten

Petrus Rutgerus Bartray

Maarten Holtrust

Michael Ten Bhomer

Emericus Antoon Theodorus Van Den Akker

Ramo Omerovic

Henricus Anita Jozef Wilhelmus Van De Ven

The present invention provides a fluid purging system () for an optical element (), comprising a fluid guiding unit arranged to guide a fluid, provided by a fluid supply system, over at least a curved portion of an optical surface () of the optical element. The fluid guiding unit comprises a fluid inlet and a first nozzle unit () for providing a fluid to the optical surface. The fluid guiding unit being formed by at least a first wall portion () and at least a second wall portion (), wherein the second wall portion being configured to face the optical surface and to follow a contour of the optical surface. The second wall portion comprises a second nozzle unit ().

Fluid purging system

The present invention provides a fluid purging system () for an optical element (), comprising a ring and a fluid supply system (). The ring being formed of a body entirely surrounding the optical element, the ring defining a space () radially inwards thereof and adjacent to the optical element. The ring is formed by at least one first wall portion () and at least one second wall portion (A;B), wherein an average height of the first wall portion is greater than an average height of the second wall portion. The fluid supply system is positioned radially outwards of the ring and configured to supply fluid to pass over the at least one second wall portion to the space.

Fluid purging system, projection system, illumination system, lithographic apparatus, and method

A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

Cleaning device and method of cleaning

A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Lithographic apparatus and device manufacturing method involving a barrier structure to handle liquid

An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Inspection substrate and an inspection method

A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.

Lithographic apparatus and device manufacturing method

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.

A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.

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Amersfoort, Netherlands

Ferdy Migchelbrink