Asml Netherlands B.v.

Ferdinandus Martinus Jozef Henricus Van De Wetering

Marcus Adrianus Van De Kerkhof

Vadim Yevgenyevich Banine

Andrei Mikhailovich Yakunin

Andrey Alexandrovich Nikipelov

Edwin Te Sligte

Christian Gerardus Norbertus Hendricus Marie Cloin

A reticle conditioning system includes: a support structure to support a reticle; a gas supply module to provide a flow of gas adjacent to the reticle; and a biasing module to control an electrical potential of the reticle. The biasing module includes a first electrode, a second electrode and a voltage supply. The first and second electrodes are each spaced apart from and facing the reticle, when the reticle is supported by the support structure, so as to at least partially overlap with the reticle. The voltage supply is arranged to maintain the first electrode at a positive voltage, and the second electrode at a negative voltage, these voltages being such that the voltage of the reticle is negative. The second electrode is disposed such that, when the reticle is supported by the support structure, it does not overlap an image forming portion of the reticle.

Patterning device conditioning system and method

A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.

Component for use in a patterning device environment

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Eindhoven, Netherlands

Ferdinandus Martinus Jozef Henricus Van De Wetering