Atotech Deutschland Gmbh

Atotech Deutschland Gmbh & Co. Kg

Ferdinand Wiener

Henry Kunze

Reinhard Schneider

Uwe Hauf

Britta Scheller

Lorenz Kopp

Ray Weinhold

Christian Thomas

Heinz Klingl

Olaf Lorenz

Stefan Grüßner

Felix MÖRLEIN

An electrode for an apparatus () for electrolytically treating a workpiece (), the apparatus () being of a type arranged to convey the workpiece () with a surface to be treated past and directed towards a surface of the electrode, is divided into segments (-) at at least this surface of the electrode. The segments (-) are arranged next to each other in a first direction (x). Adjacent segments (-) are separated from each other along respective segment edges (-) such as to allow adjacent segments (-) to be maintained at different respective voltages. The segment edges (-) extend at least partly in a second direction (y) from a common value (y) of a co-ordinate in the second direction (y) to an edge () of at least an electrically conducting part of the electrode surface, the second direction (y) being transverse to the first direction (x) and corresponding to a direction of movement of the workpiece, in use. The segment edges (-) between at least one pair of adjacent segments (-) extend along respective paths of which an angle to the electrode surface edge () decreases from the common value (y) of the co-ordinate to the electrode surface edge ().

Electrode and apparatus for electrolytically treating a workpiece, assembly for forming a cell of the apparatus and method and computer program

A device for a cell of an apparatus for wet processing of a planar workpiece, comprises a structure comprising first and second walls. The workpiece is movable in a central plane through a space between the first and second walls in a first direction (y). Apertures for introducing pressurised liquid between the first and second walls are on opposite sides of the central plane and facing the central plane. The apertures are distributed in the first direction (y) and in a second direction (x) transverse to the first direction (y). Discharge openings for the liquid to leave the space are on opposite sides, in the second direction (x), along the space in the first direction (y). The first and second walls form barriers to liquid flow from the space in a direction (z) perpendicular to the central plane. Channels through the walls are arranged to conduct liquid to respective one of the apertures.

Apparatus for wet processing of a planar workpiece, device for a cell of the apparatus and method of operating the apparatus

The present invention refers to a new type of transport roller providing a modified surface to provide improved transport properties for new substrates. Furthermore, it refers to horizontal transport systems beneficially utilizing such transport rollers, especially for providing retaining roller pairs. Additionally, the present invention refers to a treatment device containing such transport roller or horizontal transport system. Furthermore, it refers to a method for treating a substrate and the use of such transport roller.

Transport roller

A method and device for vertical galvanic metal deposition on a substrate, the device including at least first and second device elements arranged vertically parallel to each other, the first device element including at least a first anode element having a plurality of through-going conduits and at least a first carrier element having a plurality of through-going conduits, the at least first anode element and the at least first carrier element firmly connected to each other; and the second device element including at least a first substrate holder adapted to receive at least one substrate to be treated, the at least one substrate holder at least partially surrounding the at least one substrate along its outer frame after receiving it; the distance between the first anode element and the at least first substrate holder ranging from 2 to 15 mm.

Device for vertical galvanic metal deposition on a substrate

The deviceaccording to the invention is suggested for gentle treatment of a flat material B to be treated with a treatment liquid F. The devicehas the following components: at least one treatment chamber, in which the treatment liquid F can be accumulated up to a bath level M, at least one supply devicefor the supply of the treatment liquid F into the at least one treatment chamber, at least one transport device, with which the material B to be treated can be transported in the horizontal position in a transport plane E below the bath level M through the at least one treatment chamber, at least one reception areafor the treatment liquid F, and at least one discharge devicewith, respectively, at least one discharge openingfor the treatment liquid F for conveying it from the at least one treatment chamberwith a respective discharge rate into the at least one reception area. The at least one discharge devicerespectively has at least one regulating system, with which the discharge rate of the treatment liquid F is adjustable through the at least one discharge opening

Device and method for the treatment of flat material to be treated

In order to remove treatment liquid () from a planar material to be treated (), which is transported in an assembly for wet-chemical treatment of the material to be treated (), a retaining surface () is provided for holding back the treatment liquid (). The retaining surface () is arranged relative to a transport path of the material to be treated () so that a gap () remains between the retaining surface () and a surface of the material to be treated () opposing the retaining surface (), when the material to be treated () is moved past the retaining surface (). The retaining surface () may, for example, be provided as an offset portion of a peripheral surface of a roll ().

Method and assembly for treating a planar material to be treated and device for removing or holding off treatment liquid

Apparatus for the electrolytic treatment of the product L using a treatment agent is used to make the treatment of a plate-shaped product more uniform. This apparatus includes devicesfor retaining the product L in the apparatus, one or more flow devices, which each include at least one nozzleand are disposed situated opposite the product L, one or more counter electrodes, which are inert relative to the treatment agent and are disposed parallel to at least one treatment surface, eccentric motor means for generating a relative movementbetween the product L, on the side, and the flow devicesand/or the counter electrodes, on the other side, in at least one direction parallel to a treatment surface. The product L can be immersed in the treatment agent during treatment.

Apparatus and method for the electrolytic treatment of a plate-shaped product

Vertical system for the plating treatment of a work piece, the system comprising at least two treatment modules, wherein retaining devices for the work pieces are provided in the treatment modules, and at least one transport device including at least one gripping device, which retains the work piece and has a respective fastening device, and each fastening device comprises first and second clamping devices, each associated with one side of the work piece, wherein both the first and second clamping devices are displaceable for gripping and releasing the work pieces, wherein the gripping device comprises at least two fastening devices that are spaced apart from one another, each of the first and second clamping devices are moveable torsion bars as a result of which the work piece is tensioned between the fastening devices during clamping parallel to its first side.

Vertical system for the plating treatment of a work piece and method for conveying the work piece

The present invention relates to treatment units for the wet-chemical or electrolytic treatment of flat workpieces (), such as metal foils, printed circuit foils or printed circuit boards, in which the workpieces () are transported on a conveying path by means of conveying members (). The treatment unit comprises carrier elements () with recesses (), said carrier elements () being oriented to be parallel to the conveying path, and at least one module system for carrying the conveying members () that consist of insertion elements (), preferably arranged in pairs, the at least one module system being configured such that it registers with and is preferably slidable into the recesses () of the carrier elements (). The treatment unit is preferably utilized in horizontal conveyorized lines.

Treatment unit for the wet-chemical or electrolytic treatment of flat workpieces

A nozzle arrangement is described which may in particular be used as a flow nozzle in galvanization systems with horizontal throughput of printed-circuit boards. The nozzle arrangement comprises a longitudinal housing () with at least one fluid feed opening to feed a treatment fluid for treating a work piece, for example a printed-circuit board, and preferably a plurality of slotted fluid delivery openings () for releasing the treatment fluid. In the housing () a fluid channel () is formed for feeding the treatment fluid from the fluid feed opening to the fluid delivery openings (). In order to achieve the most even possible flow speed of the treatment fluid at the fluid delivery openings (), (a) the throughput of the fluid channel () for the treatment fluid reduces continuously from the fluid feed opening in the longitudinal direction of the housing () and/or (b) before the delivery of the fluid from the fluid delivery openings () a storage chamber is provided.

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Burgthann, Germany

Ferdinand Wiener