Hkc Corporation Limited

Chongqing Hkc Optoelectronics Technology Co., Ltd.

Chuzhou Hkc Optoelectronics Technology Co., Ltd.

Hkc Corporation Limited Chongqing Hkc Optoelectronics Technology Co., Ltd.

Beihai Hkg Optoelectronicstechnology Co., Ltd.

Fengyun Yang

En-Tsung Cho

Je-hao Hsu

Haijiang Yuan

Yong Zhang

Zhen Liu

Yuming Xia

En-tsung Cho

Hejing Zhang

Qionghua Mo

Wanfei Yong

This application discloses a photoreceptor, a panel, and a method for manufacturing a photoreceptor. The photoreceptor includes a photosensitive layer. The photosensitive layer includes a subject entity including a plurality of holes, and an object entity including at least two photosensitive materials whose photosensitive wavelength bands are different. The holes of the subject entity are filled with the photosensitive materials.

Photoreceptor, panel, and method for manufacturing photoreceptor

The present application discloses an array substrate, a manufacturing method therefor and a display panel. The manufacturing method for the array substrate includes steps of: forming a base layer; forming a semiconductor layer on the base layer; forming a metal layer on the semiconductor layer, where the upper surface of the metal layer contains a first nitride or a first oxide; etching the metal layer into a source/drain electrode; and forming a passivation layer on the source/drain electrode, where the passivation layer is a second nitride structure corresponding to the first nitride or a second oxide structure corresponding to the first oxide.

Array substrate, manufacturing method therefor and display panel

Disclosed is a manufacture method of the array substrate, including: sequentially forming a gate, a gate insulating layer, an active layer, an ohmic contact layer and a metal layer on a substrate, forming a photoetching mask on the metal layer, where thickness of the photoetching mask in a half exposure area of the mask plate is from 2000 Å to 6000 Å; etching the metal layer, the ohmic contact layer and the active layer outside a covering area of the photoetching mask; ashing the photoetching mask for a preset time with an ashing reactant, wherein the ashing reactant comprises oxygen, and the preset time is from 70 seconds to 100 seconds; and sequentially etching the metal layer, the ohmic contact layer and the active layer based on the ashed photoetching mask, and forming a channel region of the array substrate. The present disclosure further discloses an array substrate, and a display panel.

Manufacture method of array substrate, array substrate, and display panel

Disclosed are an optical fingerprint sensor, a preparation method thereof and a display device. The optical fingerprint sensor includes: a substrate; and a sensor unit, disposed on the substrate and including a thin film transistor and a photosensor electrically connected to the thin film transistor, where the thin film transistor includes a source electrode, a drain electrode, a semiconductor layer, and a light shield layer formed over a channel region between the source electrode and the drain electrode and shielding the semiconductor layer exposed in the channel region.

Optical fingerprint sensor, preparation method thereof, and display device

The present application discloses a display panel preparation method and a display panel. The display panel preparation method includes: forming a first metal layer, a buffer layer, an oxide film layer, and a gate insulating layer on a substrate; and etching on a second layer of metal by using a same mask process, to obtain a gate layer, a source layer, and a drain layer.

Display panel preparation method and display panel

This application provides a method for manufacturing an array substrate, an array substrate, and a display panel. A gate metal layer, a gate insulating layer, and a semiconductor active layer are formed by using one photomask process, a first passivation layer is formed in one photomask process, and a source metal layer, a drain metal layer, and a pixel electrode layer are formed on the first passivation layer.

Method for manufacturing array substrate, array substrate and display panel

The present application provides a display panel and a method for manufacturing the same. The method includes: forming a groove right above a gate electrode and a first through hole above a substrate on a photoresist layer by using a halftone photomask with multi-transmittance and dividing the photoresist layer into a first region and a second region through the first through hole.

Display panel and method for manufacturing the same

The present invention discloses a display panel, the manufacturing method of the display panel, and a display device. The display panel comprises a first substrate with a display area and a non-display area, wherein the display area comprises a plurality of transistors, and a light sensor is adjacent to the plurality of transistors.

Display panel and display device

The present invention provides a display panel and a display apparatus using the same. The display panel comprises: a first substrate; a second substrate; a liquid crystal layer disposed between the first substrate and the second substrate; an image sensing module disposed on one side of the second substrate facing the first substrate; a lens array disposed on one side of the first substrate facing the second substrate and on a position corresponding to the image sensing module; and an active switch array disposed on the side of the second substrate facing the first substrate, wherein the image sensing module is configured to receive the focused image light.

Growing community of inventors

Chongqing, China

Fengyun Yang