Globalfoundries Inc.

Feng Wang

Sunil Kumar Singh

Norman Chen

Sohan Singh Mehta

Shaowen Gao

Craig D Higgins

Hongxin Zhang

Vineet Sharma

A method of creating an optical proximity correction (OPC) model and assessing the model through optical rule checking (ORC) includes the introduction of post-integration, i.e., post-metallization data. High density critical dimension scanning electron microscopy and backscattered electron scanning electron microscopy from a metallized structure are used during development and verification of the model to accurately predict post-integration behavior.

Methodology for post-integration awareness in optical proximity correction

A litho-litho-etch double patterning method including forming a resist layer by coating a substrate with a resist composition; exposing the resist layer to a first radiant energy density of UV rays; forming a first pattern in the resist layer by developing the resist layer with a positive developer; exposing the resist layer to a second radiant energy density of UV rays; and forming a second pattern in the resist layer by developing the resist layer with a negative developer, the second pattern including one or more features of the first pattern.

Litho-litho-etch double patterning method

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Clifton Park, NY, United States of America

Feng Wang