Asml Netherlands B.v.

Federico La Torre

Laurentius Johannes Adrianus Van Bokhoven

Andre Bernardus Jeunink

Bearrach Moest

Yang-Shan Huang

Hoite Pieter Theodoor Tolsma

Stefan Carolus Jacobus Antonius Keij

Enno Van Den Brink

Stan Henricus Van Der Meulen

Christine Henriette Schouten

Erik Henricus Egidius Catharina Eummelen

Frank Johannes Jacobus Van Boxtel

Gerben Pieterse

José Nilton Fonseca, Jr

A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.

Lithographic apparatus with improved patterning performance

A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

Lithographic method

A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

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Eindhoven, Netherlands

Federico La Torre