Newport Fab, LLC

Farnood Rezaie

Edward J Preisler

Oleg Martynov

A semiconductor structure includes a group III-V chiplet over a group IV substrate. A group IV optoelectronic device is situated in the group IV substrate. A patterned group III-V optoelectronic device is situated in the group III-V chiplet. A heating element is near the group IV optoelectronic device, or alternatively, near the patterned group III-V optoelectronic device. A dielectric layer is over the patterned group III-V optoelectronic device. A venting hole is in the dielectric layer in proximity of the heating element. A cavity is in the group IV substrate in proximity to the heating element.

Semiconductor structure having group III-V chiplet on group IV substrate and cavity in proximity to heating element

There are disclosed herein various implementations of a silicon-on-insulator (SOI) die including a light emitting layer pedestal-aligned with a light receiving segment, as well as methods for fabricating such an SOI die. The SOT die includes a pedestal region of the SOI die having a pedestal including a thin top silicon segment, a buried oxide (BOX) segment, and a handle wafer segment. The SOI die also includes an integrated circuit (IC) region having a thin silicon waveguide that is aligned with the thin top silicon segment in the pedestal region. A light emitting layer is situated over the pedestal in the pedestal region, the light emitting layer being aligned with the light receiving segment to situated over the thin silicon waveguide in the IC region.

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Irvine, CA, United States of America

Farnood Rezaie