Tsinghua University

Beijing U-Precision Tech Co., Ltd.

Fan Zhi

Ming Lei Zhang

Yu Zhu

Kaiming Yang

Jinchun Hu

Rong Cheng

Haihua Mu

Li Ni Zhang

Jin Zhang

Li Tian

Wensheng Yin

Zhao Liu

Weinan Ye

Yanpo Zhao

Huichao Qin

Feng Liu

Dengfeng Xu

Chuxiong Hu

Anlin Chen

Yujing Song

A six-degree-of-freedom displacement measurement method for an exposure region on a wafer stage, the wafer stage comprises a coil array and a movable platform. A planar grating is fixed below a permanent magnet array of the movable platform. A reading head is fixed in a gap of the coil array. A measurement region is formed on the planar grating by an incident measurement light beam of the reading head. The reading head measures the six-degree-of-freedom displacement of the measurement region, so that the six-degree-of-freedom displacement of the exposure region is obtained through calculation. In the method, the six-degree-of-freedom displacement of the exposure region at any time is measured; the measurement complexity is reduced and the measurement precision is improved, and especially, the six-degree-of-freedom displacement of the exposure region can be precisely measured at any time even if the movable platform has high flexibility.

Six-degree-of-freedom displacement measurement method for exposure region on silicon wafer stage

A coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform () of the reticle stage, a balance mass (), a drive motor, a mask plate (), a base (), a vibration isolation system (), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.

Coarse motion and fine motion integrated reticle stage driven by planar motor

A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (), a balance mass (), a drive motor, a mask plate (), a base (), a vibration isolation system (), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.

Magnetically suspended coarse motion and fine motion integrated reticle stage driven by planar motor

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Beijing, China

Fan Zhi