Asml Netherlands B.v.

Fabrizio Evangelista

Michel Riepen

Rogier Hendrikus Magdalena Cortie

Paulus Martinus Maria Liebregts

Nicolaas Rudolf Kemper

Ralph Joseph Meijers

Sjoerd Nicolaas Lambertus Donders

Johannes Catharinus Hubertus Mulkens

Erik Henricus Egidius Catharina Eummelen

David Bessems

Daniel Jozef Maria Direcks

Danny Maria Hubertus Philips

Clemens Johannes Gerardus Van Den Dungen

Adrianes Johannes Baeten

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Raymond Wilhelmus Louis Lafarre

Marco Koert Stavenga

Sergei Shulepov

Derk Jan Wilfred Klunder

Nina Vladimirovna Dziomkina

Cornelius Maria Rops

Koen Steffens

Marinus Jochemsen

Laurentius Johannes Adrianus Van Bokhoven

Richard Moerman

Takeshi Kaneko

Gert-Jan Gerardus Johannes Thomas Brands

Jan Willem Cromwijk

Pieter Lein Joseph Gunter

Sandra Van Der Graaf

Hua Li

Erik Witberg

Cornelis Cornelia De Bruijn

Adrianus Marinus Verdonck

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

Paulus Liebregts

Rogier Cortie

A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Fluid handling structure, lithographic apparatus and device manufacturing method

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode () provided on a face () of a semiconductor substrate () towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material () being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material () is provided on a side () of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.

Lithographic apparatus, sensor and method

Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply

A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps.

Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.

Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

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Eindhoven, Netherlands

Fabrizio Evangelista