Nova Corporation

Nova Measuring Instruments Ltd.

Eylon Rabinovich

Barak Bringoltz

Oded Cohen

Shay Yogev

Daniel Kandel

Noam Tal

Ariel Broitman

Eitan Rothstein

Ilya Rubinovich

Yongha Kim

Tal Zaharoni

A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.

Metrology and process control for semiconductor manufacturing

Growing community of inventors

Rehovot, Israel

Eylon Rabinovich