Asml Netherlands B.v.

Asml Holding N.v.

Ewoud Vreugdenhil

Hako Botma

Maurits Van Der Schaar

Richard Johannes Franciscus Van Haren

Harry Sewell

Wilhelmus Petrus De Boeij

Johannes Wilhelmus De Klerk

Simon De Groot

Joe Sakai

Richard Franciscus Johannes Van Haren

A method of providing a pattern on a substrate is disclosed. The method includes providing a layer of photoresist on the substrate, providing a layer of top coating over the layer of photoresist, lithographically exposing the photoresist layer and developing the photoresist to form a structure, covering the structure with a coating layer, inducing a chemical reaction between the photoresist and the coating layer, which reaction does not occur in the top coating, to form regions of modified coating layer, and removing unmodified coating layer to leave behind a patterned structure formed from the regions of modified coating layer.

Lithographic method

A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process. Also, the method may be repeated to create arrays at even higher densities.

Device manufacturing method and computer program product

A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.

Method for patterning a radiation beam, patterning device for patterning a radiation beam

A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.

Lithographic apparatus, beam delivery systems, prisms and device manufacturing method

A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an illumination system for conditioning the beam of radiation beam so as to provide a conditioned radiation beam so as to be able to illuminate said patterning means, and a beam delivery system including redirecting elements for redirecting and delivering the projection beam from the radiation system to the illumination system. The radiation beam is arranged to have a predetermined polarization state and the redirecting elements are arranged to provide a minimum radiation loss in relation to the predetermined polarization state of the radiation beam.

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Valkenswaard, Netherlands

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