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Evgeny Dmitrievich Korop

Vadim Yevgenyevich Banine

Konstantin Nikolaevitch Koshelev

Konstantin Nikolaevich Koshelev

Vladimir Vitalevich Ivanov

Yurii Victorovitch Sidelnikov

Oleg Yakushev

Vladimir Mihailovitch Krivtsun

Nikolai Pavlovich Kozlov

Vladimir Mihallovitch Krivtsun

Alexandr Semenovich Kamrukov

Sergei Gennadievich Shashkovsky

Vladimir Pavlovich Arkhipov

Mikhail Stepanovich Yalovik

Valery Anatolievich Kukanov

An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

Apparatus with plasma radiation source and method of forming a beam of radiation

An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus

A method of treatment of liquid, air and surfaces using UV radiation with a pulse duration of 10,to 10,sec. and a radiation intensity of at least 100 kWt/m,, using a plasma radiation source with a pulsed storage element, wherein the energy stored in the storage element at the time of discharge, the pulse duration and the area of the radiating surface of the radiation source are interrelated as follows: W,/A S,>1, where W,, is the energy stored in the storage element, Joules; S,is the area of the radiating surface of the radiation source, m,; t,is the radiation pulse duration at mid-height of a peak, sec.; A&equals;10,Wt/m,is the constant coefficient. A device for the UV treatment of liquid, air and surfaces includes a secondary winding integrated in a series with a charged condenser, and a pulsed lamp to form a discharging circuit.

Method and device for UV treatment of liquids, air and surfaces

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Troitsk, Russia

Evgeny Dmitrievich Korop