Kla Corporation

Evgeniia Butaeva

Gildardo Rios Delgado

John Savee

Matthew Derstine

Grace H Chen

Gary V Lopez Lopez

Serguei Likhanski

Vera (Guorong) Zhuang

A material recovery system for an optical component includes a reservoir containing gas and configured to supply a gas flow containing the gas. The material recovery system also includes an ion beam generator disposed on the reservoir and configured to receive the gas flow and to ionize the gas in the gas flow to generate an ion beam. The ion beam is configured to be directed to the optical component to remove at least a portion of a F-containing optical material degraded by exposure to VUV radiation, DUV radiation, and/or photo-contamination.

Material recovery systems for optical components

A system for mitigating damage to optical elements caused by vacuum ultraviolet (VUV) light exposure is disclosed. The system includes a light source configured to generate VUV and a chamber containing one or more gaseous fluorine-based compounds of a selected partial pressure. The system includes one or more optical elements. The one or more optical elements are located within the chamber and are exposed to the one or more gaseous fluorine-based compounds. The VUV light generated by the light source is of sufficient energy to dissociate the fluorine-based compound within the chamber into a primary product.

System and method for protecting optics from vacuum ultraviolet light

Growing community of inventors

San Jose, CA, United States of America

Evgeniia Butaeva