Asml Netherlands B.v.

Evert Van Vliet

Johannes Catharinus Hubertus Mulkens

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Erik Henricus Egidius Catharina Eummelen

Marcel Beckers

Cornelius Maria Rops

Paulus Martinus Maria Liebregts

Rogier Hendrikus Magdalena Cortie

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Cédric Désiré Grouwstra

Richard Moerman

Gheorghe Tanasa

Danny Maria Hubertus Philips

Pieter Mulder

Koen Cuypers

Mark Johannes Hermanus Frencken

Clemens Johannes Gerardus Van Den Dungen

Harold Sebastiaan Buddenberg

Pepijn Van Den Eijnden

Floor Lodewijk Keukens

Marcel Maria Cornelius Franciscus Teunissen

Nicolaas Franciscus Koppelaars

Jantien Laura Van Erve

Remko Jan Peter Verhees

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Lithographic apparatus

Growing community of inventors

Eindhoven, Netherlands

Evert Van Vliet