Intel Corporation

Other

Everett X Wang

Dmitri E Nikonov

Francisco A Leon

Jack T Kavalieros

Robert S Chau

Brian S Doyle

Matthew V Metz

Mark L Doczy

Suman Datta

Justin K Brask

Martin D Giles

Yi Ding

Been Y Jin

Mark Stettler

Lucian Shifren

Philippe Matagne

Sai Yu

A transistor may be formed of different layers of silicon germanium, a lowest layer having a graded germanium concentration and upper layers having constant germanium concentrations such that the lowest layer is of the form SiGe. The highest layer may be of the form SiGeon the PMOS side. A source and drain may be formed of epitaxial silicon germanium of the form SiGeon the PMOS side. In some embodiments, x is greater than y and z is greater than x in the PMOS device. Thus, a PMOS device may be formed with both uniaxial compressive stress in the channel direction and in-plane biaxial compressive stress. This combination of stress may result in higher mobility and increased device performance in some cases.

Complementary metal oxide semiconductor integrated circuit using uniaxial compressive stress and biaxial compressive stress

Provided are a method and a system, wherein optical beams of a plurality of wavelengths are directed through a plurality of optical devices, wherein waveguides comprising the optical devices have different fabrication errors, and wherein the waveguides have a plurality of waveguide lengths and a plurality of waveguide widths. Optical phase errors corresponding to the waveguides are measured by the optical devices. A determination is made of the components of the optical phase errors for the waveguides from the measured phase errors.

Extracting phase error in waveguides

A fabrication method reduces minimum waveguide spacing in an integrated optical device. Core regions of the waveguides are etched into cladding material and then filled with core material, instead of etching the spacing between the core material first and then filling the spacing. This allows the spacing between the core regions to be made arbitrarily small, without being constrained by an aspect ratio associated with a conventional etch and deposition/re-flow process used to form waveguide spacings.

Fabrication of optical waveguides for reduction of minimum waveguide spacing

Various methods, apparatuses, and systems in which a single-track vehicle has a retractable auxiliary-support wheel assembly and a computer control system. In an embodiment, the single-track vehicle has an elongated body. The retractable auxiliary-support wheel assembly mounts on both sides of the elongated body. The computer control system analyzes signals from one or more sensors to dynamically balance the single-track vehicle.

Computerized automated dynamic control system for single-track vehicles

Substantially sharp corners for optical waveguides in integrated optical devices, photonic crystal devices, or for micro-devices, can be fabricated. Non-sharp corners such as rounded corners, are first formed using lithographic patterning and vertical etching. Next, isotropic etching is used to sharpen the rounded corners. A monitor can be used to determine if the rounded corners have been sufficiently sharpened by the isotropic etching.

Method of fabrication to sharpen corners of Y-branches in integrated optical components and other micro-devices

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San Jose, CA, United States of America

Everett X Wang