Siemens Aktiengesellschaft

Eva Rissel

Siegfried Birkle

Recai Sezi

Hellmut Ahne

Rainer Leuschner

Michael Sebald

Hans-Dieter Feucht

Rainer Kamps

Eberhard Kuehn

Horst Borndoerfer

Horst Borndorfer

Richard Dotzer

Kurt Geibel

In a process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides, a bis-o-aminophenol or a bis-o-aminothiophenol is reacted with a dicarboxylic acid derivative of the following structure: ##STR1## with D=O, S, or NH and where R* is the parent body of the dicarboxylic acid and at least one of the groups R.sup.1 and R.sup.2 is CN or NO.sub.2.

Preparation of poly-o-hydroxyamides and poly o-mercaptoamides

A method for producing poly-o-hydroxy amides by conversion of an activated dicarboxylic acid derivative with a bis-o-aminophenol. A solution of the activated dicarboxylic acid derivative is added to a solution of the bis-o-aminophenol in a lactone, and a tertiary amine is added to the resulting mixture, wherein the lactone has the following structure: ##STR1## where A is--(CR.sup.1 R.sup.2).sub.m --or--(CR.sup.3 R.sup.4).sub.n --NR.sup.5 --,

Method for the production of poly-o-hydroxyamides

Premixed polymers which can serve as base polymers for high-resolution resists are structured from 40 to 99 mole % of a tert. butyl ester of an unsaturated carboxylic acid and 1 to 60 mole % of an anhydride of an unsaturated carboxylic acid.

Mixed polymers

Methods for producing solutions of polybenzoxazol precursors that are soluble in alkali and resist solutions based on such precursors. A dicarboxylic acid halogenide is reacted with a bis-(o-aminophenol) in an organic solvent and in the presence of a polymer with a tertiary N atom, which is insoluble in the solvent. Excess polymer and hydrohalogenide are separated from the reaction solution. The reaction solution is optionally mixed with a photoactive component.

Methods for producing polybenzoxazol precursors and corresponding resist

New mixed polymers which can serve as base polymers for high-resolution resists are structured from 40 to 99 mole % of a tert. butyl ester of an unsaturated carboxylic acid and 1 to 60 mole % of an anhydride of an unsaturated carboxylic acid.

Copolymers

High resolution resist structures with steep edges are obtained using standard equipment, with high sensitivity, particularly in the deep UV range. A photoresist layer consisting of a polymer having anhydride groups and blocked imide- or phenolic hydroxyl groups and of a photoactive component which forms a strong acid during irradiation is first deposited on a substrate, followed by irradiation with a patterned image. The irradiated photoresist layer is then treated with a water-based or a water-alcohol-based solution of a polyfunctional amino- or hydroxy-siloxane, and is etched in an oxygen-containing plasma.

Method for producing a resist structure

High resolution resist structures with steep edges are obtained using standard equipment, even in cases involving critical contact-hole planes. First, a photoresist layer containing a polymer with chemically reactive groups and a photoactive component based on diazoketone or quinone diazide is deposited on a substrate. The photoresist layer is then irradiated with a patterned image and treated with a polyfunctional organic compound having functional groups that can chemically react with the reactive groups of the polymer. This step is followed by a maskless flood exposure. The photoresist layer irradiated in this manner is then treated with a metal-containing organic compound having at least one functional group capable of chemical reaction with the reactive groups of the polymer, followed by etching in an oxygen-containing plasma.

The invention provides a radiation-curable liquid resin useful as a secondary coating of lightwave guides. The resin is a reaction product of (meth)acrylic acid or glyceroldi(meth)acrylate or pentaerythritoltri(meth)acrylate with a 2:1 addition compound of a diepoxide and an .alpha.,.omega. -diol with a mean molecular weight between 600 and 3000, or, a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a conversion product of the 2:1 addition compound and a low-molecular monovalent alcohol C.sub.1 to C.sub.10), a low-molecular bivalent alcohol (C.sub.2 to C.sub.4) or water, where the diepoxide is an aromatic diglycidylether and the .alpha.,.omega. -diol is an .alpha.,.omega.-hydroxy-terminated polyoxyalkylene, an .alpha.,.omega. -hydroxy-terminated polyester, an .alpha.,.omega. -hydroxy-terminated polybutadiene or an .alpha.,.omega. -hydroxy-terminated organo-functional polysiloxane.

Radiation-curable liquid resin for secondary coating of lightwave guides

The invention provides a radiation-curable liquid resin useful as a secondary coating of lightwave guides. The resin is a reaction product of (meth)acrylic acid or glyceroldi (meth)acrylate or Pentaerythritoltri(meth)acrylate with a 2:1 addition compound of a diepoxide and an .alpha., .omega.-diol with a mean molecular weight between 600 and 3000, or, a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a conversion product of the 2:1 addition compound and a low-molecular monovalent alcohol (C.sub.1 to C.sub.10), a low-molecular bivalent alcohol (C.sub.2 to C.sub.4) or water, where the diepoxide is an aromatic diglycidylether and the .alpha.,.omega.-diol is an .alpha., .omega.-hydroxy-terminated polyoxyalkylene, an .alpha., .omega.-hydroxy-terminated polyester, an .alpha.,.omega.-hydroxy-terminated polybutadiene or an .alpha.,.omega.-hydroxy-terminated organo-functional polysiloxane.

The invention provides a radiation-curable liquid resin for use as a secondary coating of lightwave guides which is a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a 1:2 addition compound of a diepoxide with a mean molecular weight.ltoreq.1000 and a short-chain .alpha.,.omega. -diol with a mean molecular weight.ltoreq.700 or with a 1:2 addition compound of a diepoxide with a mean molecular weight.ltoreq.400 and a monovalent aliphatic alcohol with a mean molecular weight.ltoreq.200, where the diepoxide is an aliphatic-aromatic or aromatic diglycidylether, an aliphatic or cycloaliphatic diepoxide or a silicon-organodiepoxide, and where the short-chain .alpha.,.omega. -diol is an .alpha..omega. -hydroxy-terminated polyoxyalkylene, an .alpha.,.omega. -hydroxy-terminated polyester, an .alpha.,.omega. -hydroxy-terminated polybutadiene, an .alpha.,.omega. -hydroxyterminated organo-functional polysiloxane or an .alpha.,.omega. -alkanediol with a mean molecular weight.ltoreq.200.

Radiation-curable liquid resin for secondary coating lightwave guides

The invention relates to a method for the currentless catalytic precipitation of aluminum. The surface of insulating and conductive materials (substrates) to be aluminized is (1) catalyzed, while a film-forming moisture-insensitive layer is developed, with a compound active at the boundary surfaces, by a brief immersion in a dilute solution of (a) a modified ester or acylate of titanium, zirconium or vanadium, substituted at the metal atom with short- and long-chain organic radicals or (b), a chloride of the transition metals of the IV and V secondary group of the periodic system of the elements and a water-containing metal soap of a polyvalent metal, preferably aluminum soaps; (2) is intensively rinsed with aprotic solvents, preferably having a boiling point of over 100.degree. C.; and (3) is immersed in a 1 to 4% solution of trialkylaminalanes in a solvent mixture of aromatic and highly viscous aliphatic compounds. A homogeneous and strongly adhering aluminum coating is thereby obtained. Insulating and conductive materials and components, e.g., electronic components and reflectors can in this manner be homogeneously coated with strongly adherent aluminum.

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Forchheim, Germany

Eva Rissel