Asml Netherlands B.v.

Koninklijke Philips Corporation N.V.

Philips Intellectual Property & Standards Gmbh

Eva Mondt

Michel Riepen

Hernes Jacobs

Erik Roelof Loopstra

Christiaan Alexander Hoogendam

Ronald Van Der Ham

Paulus Martinus Maria Liebregts

Koen Steffens

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Paul Petrus Joannes Berkvens

Patrick Johannes Wilhelmus Spruytenburg

Gert-Jan Gerardus Johannes Thomas Brands

Christophe De Metsenaere

Mathieus Anna Karel Van Lierop

Joris Johan Anne-Marie Verstraete

Franciscus Johannes Joseph Janssen

Paulus Cornelis Duineveld

Alexander Nikolov Zdravkov

Jeroen Johannes Sophia Maria Mertens

Nicolaas Ten Kate

Johannes Tseard Van Der Kooi

Marcio Alexandre Cano Miranda

Daniël Jozef Maria Direcks

Fokke Roelof Voorhorst

Noud Jan Gilissen

Georg Greuel

Teunis Cornelis Van Den Dool

Marcus Martinus Petrus Adrianus Vermeulen

Daniel Jozef Maria Direcks

Marc Alexander Pastoors

Frank B Sperling

Bastian Cornelis Kleine-Doepke

Hendrik Richard Jousma

Harko Jan Taekema

Suzan Leonie Auer-Jongepier

Wilhelmus Hendrikus Maria Bruggink

Willem Sjouke Wijma

Einte Holwerda

Paulus Martinus Hubertus Vissers

Johannes Tseard Van Der Kool

Daiyu Hayashi

Maiza Georgien Salomons

Richard Henrik Jousma

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

A device () comprises filtering means () for removing particles from a fluid, which have a particle collecting face () for collecting particles during use of the device (), and a chamber () in which a fluid is present and in which the filtering means () are arranged. An inlet () of the chamber () comprises a spouting part () which serves for spouting the fluid to be filtered in a direction towards the particle collecting face () of the filtering means (). An arrangement of the spouting part () and the particle collecting face () with respect to each other is adapted to generate, during operation of the device (), a rotating flow pattern in the fluid that is present in the chamber () under the influence of the flow of the fluid to be filtered, whereby particles can be blown away from the particle collecting face ().

Device for purifying a fluid

A device () comprises a source () for emitting ultraviolet light, an inlet () for letting in fluid to the device (), an outlet () for letting out fluid from the device (), and means () for performing a straightening action of a flow of fluid through the device (). The flow straightening means comprise at least one flow straightening element () having inlet openings for letting in fluid at one side and outlet openings for letting out fluid at another side, wherein each inlet opening is in communication with a plurality of outlet openings, and wherein the element () comprises a maze of randomly arranged, interconnected holes. In such a structure, a water element that is moving from one side of the element () to another side may take one of various paths, as a result of which variations in inlet conditions can be dampened.

Device comprising a source for emitting ultraviolet light

A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35&#xb0; and 90&#xb0; to the local tangent of the gap.

Lithographic apparatus and method of removing liquid

A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.

Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table

A device including a housing having an interior space for containing fluid, an inlet for letting in fluid to the housing, an outlet for letting out fluid from the housing, an element which is arranged inside the housing, and fluid guiding components which are arranged in the housing as well and which serve for guiding the fluid from the inlet side of the housing to the outlet side of the housing, around the element. The fluid guiding components may be zigzag-shaped extending along at least a portion of the element and, as a combination, providing complete coverage of the element in a circumferential direction.

Device comprising means for guiding fluid from an inlet to an outlet

A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.

Lithographic apparatus and method

A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.

Substrate table, lithographic apparatus and device manufacturing method

Growing community of inventors

Eindhoven, Netherlands

Eva Mondt