Samsung Electronics Co., Ltd.

Eungkyu Lee

Seokho Kim

Junemo Koo

Dong-Eun Jang

Yongdon Kim

Youngwoo Chung

Dongyoung Jang

Jeongrae Jo

Jinpyo Kim

Sungryoul Bae

Juneyoung Park

Soobang Kim

An image sensor includes a sensor chip and a logic chip. The sensor chip includes a first substrate, an upper bonding layer, a first wiring layer, and the logic chip includes a second substrate, a lower bonding layer, a second wiring layer. The upper and lower bonding layers contact each other, with the upper bonding layer including an upper dielectric layer, an upper conductive pad, an upper shield structure, and an upper wiring line, and the lower bonding layer including a lower dielectric layer, a lower conductive pad, a lower shield structure, and a lower wiring line. The upper wiring line, upper conductive pad, and upper shield structure being one body, and the lower wiring line, lower conductive pad, and lower shield structure being one body, the upper and lower conductive pads overlap and contact each other, and the upper and lower wiring lines overlap and contact each other.

Image sensor

Provided is an image sensor including a substrate, in which a pixel area including a plurality of unit pixels, an optical black area located outside of the pixel area, and an alignment key area located outside of the pixel area are included, the substrate having a first surface and a second surface opposing the first surface, an interconnection structure below the first surface of the substrate, photoelectric conversion elements in the pixel area of the substrate, an insulating layer on the second surface of the substrate, a grid layer on the insulating layer in the pixel area and the alignment key area, a key pattern layer between the insulating layer disposed in the alignment key area and the grid layer disposed in the alignment key area, the key pattern layer including a protruding region to correspond to the grid layer, and color filters on the insulating layer and the grid layer in the pixel area.

A semiconductor device includes a body region of a first conductivity type and a gate pattern disposed on the body region. The gate pattern has a linear portion extending in a first direction and having a uniform width and a bending portion extending from one end of the linear portion. The portion of a channel region located beneath the bending portion constitutes a channel whose length is greater than the length of the channel constituted by the portion of the channel region located beneath the linear portion.

Semiconductor device

Growing community of inventors

Seoul, South Korea

Eungkyu Lee