Cj Cheiljedang Corporation

Lg Electronics Inc.

Samsung Display Co., Ltd.

Samsung Electronics Co., Ltd.

The Asan Foundation

Wellmarker Bio Co., Ltd.

Ein's I&s Co., Ltd.

Hyundai Motor Company

Seoul National University

Goldstar, Co., Ltd.

Cheiljedang Corp.

Kolmar Korea Co., Ltd.

Republic of Korea (National Forensic Service Director Ministry of Interior and Safety)

Metabolic Engineering Laboratories Co., Ltd.

Onconic Therapeutics Inc.

Eun Young Lee

Kang Kook Lee

Hyuk Lyul Kwon

Chae Won Song

In Sun Jung

Joo Hee Jeon

Yeon Mi An

Chaun Gi Choi

Hyung Kyung Choi

Seung Ho Jung

Hee Won Kim

Eun Jeong Cho

Seung Woo Hong

Dae Hee Lee

Bo Geon Jeon

Yung Bin Chung

Do Hyung Kim

Seung Pyo Lee

Min-Sung Kim

Seul Gee Lee

Thanh Tien Nguyen

Ki Ju Im

Moon Joo Kim

Eun Bong Lee

Jong Hoon Kim

Sung Tae Kim

Yul Joong Kim

Won Jung Kim

Hak Su Kim

Dong Hee Lee

Young Woo Park

Hui-Won Yang

Eun Ji Park

Sang Wook Park

Sang Hak Kim

Mi Yeon Song

Tae Won Kim

Jin Gyun Kim

Jeong Eun Kim

Il Hwan Cho

Hee Chan Kim

Ji Yong Lee

Hyung Chul Ryu

Hyeon Sik Kim

Ji Young Noh

Jee Woong Lim

Bum-chan Park

Seok Ho Yoo

Hye Hyang Park

Dong Jin Kim

Eun Yeoung Choi

Eun Kyung Choi

Hyun Jik Lee

Hye Young Park

Jai Hee Moon

Dong Hoon Jin

Seung Mi Kim

Myoungsoo Kim

Moon Ju Kim

YoonKyung Choi

Jung Geun Jee

Jeong Hee Kim

Jae Sik Shin

Taek Jung Kim

Jae Wha Park

Seung Jong Park

Youn Jae Cho

Sungil Jo

Myeoung Hee Jang

Je Hak Kim

Eun Ji Kim

Seung Chan Kim

Hyung Ok Chun

Hye Jin Jo

Sung Geun Park

Seil Jang

So Young Ki

Hyun Ju Lee

Seong Joon Park

Young Wook Song

So Young Wang

Hae Yoon Jung

Won-Hyuk Jung

Min Hak Lee

Hun Hyeong Lim

Yeong Wook Song

Seung Hee Ha

Sang Keun Han

Jung Shin Lee

Seung Ho Kim

Seon Ha Yun

Sook Kyung Park

Seung In Kim

Seung Hee Ji

Hyeong Choi

Zang Hee Lee

So Yoon Baek

Yong Sang Hong

Ki Won Park

Yang Han Lee

A semiconductor device and a method of fabricating a semiconductor device, the device including a substrate including an element isolation film and an active region defined by the element isolation film; a word line crossing the active region in a first direction; and a bit line structure on the substrate and connected to the active region, the bit line structure extending in a second direction crossing the first direction, wherein the bit line structure includes a first cell interconnection film including an amorphous material or ruthenium, a second cell interconnection film on and extending along the first cell interconnection film and including ruthenium, and a cell capping film on and extending along the second cell interconnection film.

Semiconductor device

Box for food packaging

Semiconductor device and method of fabricating the same

Bag for food packing

Provided is a method of analyzing microhaplotypes by using a next generation sequencing (NGS). The method of analyzing microhaplotypes by using the NGS includes: (a) performing a multiplex PCR for simultaneously amplifying the microhaplotypes; (b) performing an indexing PCR by using a product of the multiplex PCR; and (c) performing the NGS by using a product of the indexing PCR.

Method of analyzing microhaplotype using next generation sequencing

According to aspects of the present invention, a peptide with any one sequence of SEQ ID NOS:1 to 3 exhibits high selective binding affinity to a target and the microcapsule has superior physicochemical stability. Therefore, the cosmetic composition containing the microcapsule linked to the peptide manifests high delivery efficiency of an active ingredient included in the capsule to target cells, thereby exhibiting superior skin-condition improvement effects.

Microcapsule including peptide having cell receptor binding affinity and cosmetic composition containing same

The present invention relates to a biomarker for predicting susceptibility to an MET inhibitor, and a use thereof, and more specifically, the present invention provides a method for predicting susceptibility to the MET inhibitor. According to the present invention, the present invention has an excellent effect of predicting susceptibility to the MET inhibitor for stomach cancer or lung cancer, and thus the present invention may be usefully employed for treating stomach cancer or lung cancer.

Combination method for treating cancer by targeting immunoglobulin superfamily member 1 (IGSF1) and mesenchymal-epithelial transition factor (MET)

The present disclosure relates to a new biomarker for predicting susceptibility to an EGFR-targeted agent and a use thereof, and more particularly, provides a biomarker for predicting susceptibility to an EGFR (Epidermal Growth Factor Receptor)-targeted agent, comprising a RON (Recepteur d'Origine Nantais) gene; a composition for predicting susceptibility to the EGFR-targeted agent, comprising an agent which measures a gene expression level of the biomarker; or an expression or activity level of a protein thereof; a composition for enhancing the susceptibility to the EGFR-targeted agent, comprising an inhibitor of the expression of the gene or the expression or activity of the protein of the gene as active ingredients; a kit for predicting the susceptibility to the EGFR-targeted agent, comprising the composition; and a method for predicting the susceptibility to the EGFR-targeted agent. According to the present disclosure, since an effect of predicting the susceptibility to the EGFR-targeted agent is excellent in a colon cancer, the present disclosure may be useful in the treatment of the colon cancer.

Biomarker for predicting sensitivity to EGFR-targeting agent, and use thereof

Packaging paper

The present invention relates to a method for determining sensitivity to a simultaneous inhibitor against poly ADP ribose polymerase (PARP) and Tankyrase. According to the present invention, a colorectal treatment effect can be maximized by sorting patients having sensitivity to the simultaneous inhibitor against PARP and Tankyrase.

Method for determining sensitivity to simultaneous inhibitor against PARP and Tankyrase

A thin film transistor array panel device comprises: a base substrate; a barrier layer disposed over the base substrate and comprising a plurality of transparent material layers; and an array of thin film transistors disposed over the barrier layer. A difference between a refractive index of the barrier layer and a refractive index of the base substrate may be within about 6%. The transparent material layers may be arranged such that the transparent material layers having compressive residual stress and the transparent material layers having tensile residual stress are alternately stacked. Each of the transparent material layers may comprise silicon oxynitride (SiON).

Thin film transistor substrate and display panel having the same

Growing community of inventors

Seoul, South Korea

Eun Young Lee