Lg Chem, Ltd

Eun Mi Choi

Min Jin Ko

Seung Beom Cho

Dong Mok Shin

Myoung Hwan Oh

Jun Seok Nho

Jong Pil Kim

Jang Yul Kim

A cerium oxide powder for one-component CMP slurry, which has a specific surface area of 5 m/g or more, and a ratio of volume fraction of pores with a diameter of 3 nm or more to that of pores with a diameter less than 3 nm of 8:2&#x2dc;2:8, is disclosed. A method for preparing the same, a one-component CMP slurry comprising the same as an abrasive material, and a method of shallow trench isolation using the one-component CMP slurry are also disclosed. The CMP slurry causes no precipitation of the cerium oxide powder even if it is provided as a one-component CMP slurry, because the CMP slurry uses, as an abrasive material, cerium oxide powder that is obtained via a low-temperature calcination step, optionally a pulverization step, and a high-temperature calcination step and has a high pore fraction and low strength.

Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry

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Seongnam-si, South Korea

Eun Mi Choi