Samsung Electronics Co., Ltd.

Eun-Mi Bae

Sang-Mun Chon

Baik-soon Choi

Seung-Hyun Ahn

Kyoung-mi Kim

Jae-ho Kim

Kwang-sub Yoon

Sang-Kyu Park

Shi-Yong Yi

Dae-Joung Kim

Yeu-Young Youn

Hoe-Sik Chung

Ok-Seok Jang

Mi-Sook Jeon

Young-Cheul Lim

A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Thinner composition and method of removing photoresist using the same

A thinner composition is effective in removing a variety of photoresists, and includes propylene glycol mono-methyl ether acetate, ethyl 3-ethoxy propionate and at least one of &ggr;-butyro lactone and propylene glycol mono-methyl ether. The thinner composition can selectively strip a photoresist coated on a backside and at an edge portion of a substrate, as well as a photoresist coated on a whole front surface of the substrate.

Thinner composition and method of stripping a photoresist using the same

A photoresist stripper composition is made up of a mixture of an acetic acid ester, &ggr;-butyrolactone (GBL), and a non-acetate ester or a poly alkyl alcohol derivative. The acetic acid ester may be at least one of n-butyl acetate, amyl acetate, ethyl aceto-acetate, and isopropyl acetate. The non-acetate ester may be at least one of ethyl lactate (EL), ethyl-3-ethoxy propionate (EEP) and methyl-3-methoxy (MMP). The poly alkyl alcohol derivative may be at least one of propylene glycol monomethyl ester (PGME) and propylene glycol monomethyl ester acetate (PGMEA).

Photoresist stripper compositions

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Yongin-si, South Korea

Eun-Mi Bae