Samsung Electronics Co., Ltd.

Eun-Ju Bae

Wan-jun Park

Yo-sep Min

Hideki Horii

Won-bong Choi

Yo-Sep Min

Won-Bong Choi

A method of growing single-walled carbon nanotubes. The method may include supplying at least one of an oxidant and an etchant into a vacuum chamber and supplying a source gas into the vacuum chamber to grow carbon nanotubes on a substrate in an oxidant or an etchant atmosphere. The carbon nanotubes may be grown in an HO plasma atmosphere. The carbon nanotubes may be grown at a temperature less than 500&#xb0; C.

Method of growing single-walled carbon nanotubes

A method for manufacturing ZnO nanowires with a small diameter and increased length and a device comprising the same. The manufacturing method includes: forming a ZnO seed layer containing a hydroxyl group on a substrate; and growing ZnO nanowires on the ZnO seed layer containing the hydroxyl group. Preferably, the ZnO seed layer is a thin ZnO seed layer containing more than 50% of the hydroxyl group.

Method for manufacturing zinc oxide nanowires and device having the same

A method of forming nitrogen-doped or other Group V-doped single-walled nanotubes including: forming a catalyst metal layer on a substrate; loading a substrate having the catalyst metal layer into a reaction chamber; forming an HO or other plasma atmosphere in a reaction chamber; and forming the nitrogen-doped or other Group V-doped carbon nanotubes on the catalyst metal layer by supplying a carbon or other Group IV precursor and a nitrogen or other Group V precursor into a reaction chamber where a chemical reaction therebetween is generated in the HO or other plasma atmosphere.

Method of forming nitrogen-doped single-walled carbon nanotubes

Provided are an n-type carbon nanotube field effect transistor (CNT FET) and a method of fabricating the n-type CNT FET. The n-type CNT FET may include a substrate; electrodes formed on the substrate and separated from each other; a CNT formed on the substrate and electrically connected to the electrodes; a gate oxide layer formed on the CNT; and a gate electrode formed on the gate oxide layer, wherein the gate oxide layer contains electron donor atoms which donate electrons to the CNT such that the CNT may be n-doped by the electron donor atoms.

N-type carbon nanotube field effect transistor and method of fabricating the same

A method of selectively removing carbonaceous impurities from carbon nanotubes (CNTs). In an example method, impurities formed on the surface of the CNTs may be removed by a sulfidation reaction between the impurities and sulfur in a sealed space. More specifically, a method of selectively removing only amorphous carbon by which carbon nanotube walls do not react with sulfur and only carbonaceous impurities formed on the surface of the CNTs make sulfidation reaction (C+2S&#x2192;CS), that is, a method of selectively removing carbonaceous impurities from the CNTs integrated in a device by sulfidation is provided.

Method of removing carbonaceous impurities in carbon nanotubes

In a method of forming a conductive line for a semiconductor device using a carbon nanotube and a semiconductor device manufactured using the method, the method includes activating a surface of an electrode of the semiconductor device using surface pretreatment to create an activated surface of the electrode, forming an insulating layer on the activated surface of the electrode, and forming a contact hole through the insulating layer to expose a portion of the activated surface of the electrode, and supplying a carbon-containing gas onto the activated surface of the electrode through the contact hole to grow a carbon nanotube, which forms the conductive line, on the activated surface of the electrode. Alternatively, the activation step of the surface of the electrode may be replaced with a formation of a catalytic metal layer on the surface of the electrode.

Growing community of inventors

Yongin-si, South Korea

Eun-Ju Bae