Samsung Display Co., Ltd.

Eun Ae Kwak

Min Hyuck Kang

Moon Gyu Lee

Gug Rae Jo

Hyeong Gyu Jang

Dong Eon Lee

Jun Ho Song

Sung Man Kim

Lei Xie

Min Uk Kim

A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

Silane coupling agent and method of manufacturing wire grid pattern using the same

A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.

Wire grid polarizer and method of fabricating the same

A display device may include: a substrate; a transparent partition wall disposed on the substrate, the transparent partition configured to define a plurality of openings; a light-shielding member disposed on a top surface and side surfaces of the transparent partition wall, the light-shielding member including a negative photosensitive organic material; and a first color conversion pattern disposed in at least on of the plurality of openings, the first color conversion pattern including a quantum dot material or a fluorescent material.

Display device and method of manufacturing the same

A method of forming fine patterns includes the steps of forming a conductive layer on a base part, forming a sacrificial layer including an adhesive material on the conductive layer, the adhesive material including a catechol group, forming resist patterns on the sacrificial layer, and forming fine patterns by patterning the conductive layer using the resist patterns as a mask.

Method for forming fine patterns

A patterning method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.

Patterning method and method of manufacturing wire grid polarizer using the same

A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.

A wire grid polarizer includes a substrate, and a plurality of wire patterns which is arranged on the substrate at periodic intervals, where the wire patterns include first wire patterns, which are disposed on the substrate, and one or more second wire patterns, which are disposed on one or more of the first wire patterns each of the second wire patterns including at least one of a neutral pattern, a surface treatment pattern and first and second monomer block patterns.

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Gunpo-si, South Korea

Eun Ae Kwak