Rohm and Haas Electronic Materials Korea Ltd.

Other

Eui-Hyun Ryu

Jin Hong Park

Jung-June Lee

Jae-Bong Lim

Chang-Young Hong

Dong-Yong Kim

Min-Kyung Jang

Jae Hwan Sim

You Rim Shin

EunHye Cho

Hye-Won Lee

Hyun Bae Jeon

Jung Kyu Jo

Myung-Yeol Kim

Myung Yeol Kim

Hae-Jin Lim

Jae Yun Ahn

Dong-Je Hong

Ji-Hon Kang

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):

Coating compositions for use with an overcoated photoresist

New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.

Photoresist compositions and methods

In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more glycidyl groups; and 2) one or more aromatic groups that each comprises two or more substituents that comprise hydroxy, thiol and/or amine moieties. Catechol-containing polymers and methods for producing same also are provided.

Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.

Overcoat compositions and methods for photolithography

New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.

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Chungcheongnam-do, South Korea

Eui-Hyun Ryu