Samsung Electronics Co., Ltd.

Eui Bok Lee

Jong Min Baek

Sang Hoon Ahn

Hyeok Sang Oh

Wandon Kim

Rakhwan Kim

Woo Kyung You

Doo-Hwan Park

Wan Don Kim

Woojin Jang

Deok Young Jung

Donggon Yoo

Wonhyuk Hong

Su Hyun Bark

SAng Hyeon Kang

Eun-Ji Jung

Yoon Tae Hwang

Rak Hwan Kim

Hyunbae Lee

Jang Ho Lee

Ki Chul Park

Jongchan Shin

Seungseok Ha

Kyung Wook Kim

Hoon Seok Seo

Minjoo Lee

Sunyoung Noh

Hyun Bae Lee

Seung Yong Yoo

Moon Kyun Song

Jin Nam Kim

Seowoo Nam

Sun Young Noh

Han Min Jang

Sang Bom Kang

A semiconductor device is provided. The semiconductor device includes: a lower line structure; an upper interlayer insulating film provided on the lower line structure and having a trench formed therein, wherein the trench includes a wiring line trench and a via trench extending from the wiring line trench to the lower line structure; and an upper line structure provided in the line trench, wherein the upper line structure includes an upper barrier film and an upper filling film. The upper filling film includes a first sub-filling film in contact with the upper interlayer insulating film, and a second sub-filling film provided on the first sub-filling film. The first sub-filling film fills an entirety of the upper via trench and covers at least a portion of a bottom surface of the upper wiring line trench.

Semiconductor device and method for manufacturing the same

A semiconductor device a first fin-shaped pattern provided at a first surface of a substrate and extending in a second direction, a first source/drain pattern disposed on the first fin-shaped pattern and connected thereto, a first source/drain contact disposed on the first source/drain pattern and connected thereto, a buried conductive pattern extending through the substrate and connected to the first source/drain contact, a contact connection via disposed between the first source/drain contact and the buried conductive pattern. The contact connection via is directly connected to the first source/drain contact and a back wiring line disposed on a second surface of the substrate and connected to the buried conductive pattern. A width of the contact connection via increases as the contact connection via extends away from the second surface. A width of the first source/drain contact decreases as the first source/drain contact extends away from the second surface of the substrate.

Semiconductor device

A semiconductor device includes: a substrate; a first interlayer insulating layer on the substrate; a first wiring pattern in a first trench of the first interlayer insulating layer; a second interlayer insulating layer on the first interlayer insulating layer; a second wiring pattern in a second trench of the second interlayer insulating layer; a third interlayer insulating layer on the second interlayer insulating layer; a third wiring pattern in a third trench of the third interlayer insulating layer, and including a wiring barrier layer and a wiring filling layer, wherein the wiring filling layer contacts the third interlayer insulating layer; a via trench extending from the first wiring pattern to the third trench; and a via including a via barrier layer and a via filling layer. The via barrier layer is in the via trench. The via filling layer contacts the first wiring pattern and the wiring filling layer.

Semiconductor device and method for fabricating the same

Disclosed is a semiconductor device including a substrate, a first interlayer dielectric layer on the substrate, a plurality of first vias in the first interlayer dielectric layer, a second interlayer dielectric layer on the first interlayer dielectric layer, and a first power line and a first lower line in the second interlayer dielectric layer that are electrically connected to respective ones of the first vias. A first width in a first direction of the first power line is greater than a second width in the first direction of the first lower line. The first power line includes a first metallic material. The first lower line includes a second metallic material. The first vias includes a third metallic material. The first, second, and third metallic materials are different from each other.

A semiconductor device includes a front-end-of-line (FEOL) layer, which includes a plurality of individual devices, on a substrate, and first, second, and third metal layers sequentially stacked on the FEOL layer. The second metal layer includes an interlayer insulating layer and an interconnection line in the interlayer insulating layer. The interconnection line includes a lower via portion electrically connected to the first metal layer, an upper via portion electrically connected to the third metal layer, and a line portion between the lower via portion and the upper via portion. A line width of an upper portion of the interconnection line gradually decreases in a vertical direction away from the substrate, and a line width of a lower portion of the interconnection line gradually increases in a vertical direction away from the substrate.

Semiconductor device and method of fabricating the same

A semiconductor device including transistors on a substrate, a first interlayer insulating layer on the transistors, a first lower interconnection line and a second lower interconnection line in an upper portion of the first interlayer insulating layer, a dielectric layer being selectively on a top surface of the first interlayer insulating layer except top surfaces of the first and second lower interconnection lines, an etch stop layer on the first and second lower interconnection lines and the dielectric layer, a second interlayer insulating layer on the etch stop layer, and an upper interconnection line in the second interlayer insulating layer may be provided.

A semiconductor device includes a transistor on a substrate, a first metal layer that is on the transistor and includes a lower wire electrically connected to the transistor, and a second metal layer on the first metal layer. The second metal layer includes an upper wire that is electrically connected to the lower wire and includes a via structure in a via hole and a line structure in a line trench. The via structure includes a via portion that is in the via hole and is coupled to the lower wire, and a barrier portion that vertically extends from the via portion to cover an inner surface of the line trench. The barrier portion is between the line structure and an insulating layer of the second metal layer. The barrier portion is thicker at its lower level than at its upper level.

Semiconductor devices and methods of fabricating the same

A FINFET includes a substrate having a semiconductor fin extending upward from a first surface thereof, and first and second power rails on first and second opposing sides of the semiconductor fin, respectively. A base of the semiconductor fin may be recessed within a trench within the surface of the substrate, and the first and second power rails may at least partially fill the trench. A through-substrate via may be provided, which extends from adjacent a second surface of the substrate to at least one of the first and second power rails. A source/drain contact is also provided, which is electrically connected to a source/drain region of the FINFET and at least one of the first and second power rails.

Semiconductor devices having highly integrated active and power distribution regions therein

Semiconductor devices including via structures having a via portion and a barrier portion

Semiconductor devices are provided. The semiconductor devices may include a substrate, a first insulating film on the substrate, a lower metal layer in the first insulating film, and a second insulating film on the first insulating film. The lower metal layer may be in the second insulating film, the second insulating film may include a lower surface facing the substrate and an upper surface that is opposite the lower surface, and the upper surface of the second insulating film may be upwardly convex. The semiconductor devices may further include a barrier dielectric film including a recess on the second insulating film, and a via metal layer that is in the recess of the barrier dielectric film and electrically connected with the lower metal layer. The first insulating film and the second insulating film may be sequentially stacked on the substrate in a vertical direction, and a longest vertical distance between an upper surface of the lower metal layer and the substrate may be less than a longest vertical distance between the upper surface of the second insulating film and the substrate.

Semiconductor devices

A semiconductor device is provided. The semiconductor device includes a substrate including a lower wiring, a first interlayer insulating film disposed on the substrate and including a first region and a second region over the first region, an etch stop film on the first interlayer insulating film, a second interlayer insulating film on the etch stop film, a first upper wiring in the second interlayer insulating film, the etch stop film, and the second region of the first interlayer insulating film and the first upper wiring is spaced apart from the lower wiring and a via in the first region of the first interlayer insulating film, and the via connects the lower wiring and the first upper wiring, wherein the first upper wiring includes a first portion in the second interlayer insulating film, and a second portion in the etch stop film and the second region of the first interlayer insulating film, and a sidewall of the second portion of the first upper wiring includes a stepwise shape.

A semiconductor device is provided. The semiconductor device includes a substrate comprising a lower wire, an etch stop layer on the substrate, an interlayer insulating layer on the etch stop layer, an upper wire disposed in the interlayer insulating layer and separated from the lower wire and a via formed in the interlayer insulating layer and the etch stop layer and connecting the lower wire with the upper wire, wherein the via comprises a first portion in the etch stop layer and a second portion in the interlayer insulating layer, and wherein a sidewall of the first portion of the via increases stepwise.

A semiconductor device includes a lower insulating layer disposed on a substrate. A conductive pattern is formed in the lower insulating layer. A middle insulating layer is disposed on the lower insulating layer and the conductive pattern. A via control region is formed in the middle insulating layer. An upper insulating layer is disposed on the middle insulating layer and the via control region. A via plug is formed to pass through the via control region and to be connected to the conductive pattern. The via control region has a lower etch rate than the middle insulating layer.

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Seoul, South Korea

Eui Bok Lee