E.i. Dupont De Nemours and Company

Applied Materials, Inc.

Aviza Technology Limited

Asml Us, Inc.

Silcon Valley Group Thermal Systems, LLC

Eugene Lopata

Peter Rose

John Thomas Felts

Andrew Edward Feiring

Theodore Arthur Treat

Michael Mocella

Yakov Brichko

A method of depositing a dielectric film exhibiting a low dielectric constant in a semiconductor and/or integrated circuit by chemical vapor deposition (CVD) is provided. The film is deposited using an organosilicon precursor in a manner such that the film is comprised of a backbone made substantially of Si&#x2014;O&#x2014;Si or Si&#x2014;N&#x2014;Si groups with organic side groups attached to the backbone.

Low &#x3ba; dielectric inorganic/organic hybrid films and method of making

A process is disclosed for forming a fluoropolymer layer on a thin film device, comprising contacting said thin film device with a gas phase fluoromonomer, and initiating polymerization of said fluoromonomer with a free radical polymerization initiator whereby said fluoromonomer polymerizes to form said fluoropolymer layer on said thin film device.

Fluoropolymer interlayer dielectric by chemical vapor deposition

A method of depositing a dielectric film exhibiting a low dielectric constant in a semiconductor and/or integrated circuit by chemical vapor deposition (CVD) is provided. The film is deposited using an organosilicon precursor in a manner such that the film is comprised of a backbone made substantially of Si&mdash;O&mdash;Si or Si&mdash;N&mdash;Si groups with organic side groups attached to the backbone.

Low &kgr; dielectric inorganic/organic hybrid films and method of making

A method of depositing a dielectric film exhibiting a low dielectric constant in a semiconductor and/or integrated circuit by chemical vapor deposition (CVD) is provided. The film is deposited using an organosilicon precursor in a manner such that the film is comprised of a backbone made substantially of Si--O--Si or Si--N--Si groups with organic side groups attached to the backbone.

Method of making low .kappa. dielectric inorganic/organic hybrid films

Growing community of inventors

Scotts Valley, CA, United States of America

Eugene Lopata