Globalfoundries Inc.

General Electric Company

Eugene Barash

James Broc Stirton

Steven Alfred Tysoe

Richard P Good

Jiejie Xu

Thomas Elliot Stecher

Pavel Alexeyevich Fomitchov

Andrew David Pris

Joseph Masino

Daniel Kost

Ahmad Yetka

Methods and computer program products for performing automatically determining when to shut down a fabrication tool, such as a semiconductor wafer fabrication tool, are provided herein. The methods include, for example, creating a measurement vector including process parameters of semiconductor wafers, creating a correlation matrix of correlations between measurements of parameters obtained of each wafer, creating autocorrelation matrixes including correlations between measurements of the parameter obtained for pairs of wafers; creating a combined matrix of correlation and autocorrelation matrixes, obtaining a Tvalue from the measurement vector and combined matrix, and stopping a semiconductor wafer fabrication tool if the Tvalue exceeds a critical value.

Methods of error detection in fabrication processes

Methods and processes for establishing a rework threshold for layers applied after thermal processing during fabrication of semiconductor devices are provided. One method includes, for instance: obtaining a device after at least one laser annealing process is completed, the device including a substrate surface and at least one layer over the substrate surface; performing lithography on the at least one layer; positioning a first contact-to-gate layer over the at least one layer; checking alignment of electrical connections between the substrate surface and the first contact-to-gate layer; determining if an overlay error is present; and adjusting at least one subsequent fabrication process pursuant to the overlay error.

Methods for overlay improvement through feed forward correction

Thermal processing and alignment methods and processes used during fabrication of semiconductor devices are provided. One method includes, for instance: obtaining a device after at least one laser annealing process is completed, the device including a substrate surface and at least one layer over the substrate surface; applying a mask layer to the at least one layer; performing lithography on the mask layer to form a top layer; positioning a first contact-to-gate layer over the top layer; checking alignment of electrical connections between the substrate surface and the first contact-to-gate layer; and determining if an adjustment is needed to at least one parameter of at least one laser annealing beam used during the laser annealing process. In enhanced aspects, the at least one laser annealing process includes: performing three laser anneals; applying three mask layers; and performing lithography three times.

Method and process to reduce stress based overlay error

A field deployable optical assembly for use in testing a light-responsive sample is disclosed. The assembly includes a microfluidic device, a first optical package, and a second optical package. The first optical package includes a light emitting diode (LED), a first optical device, and a first light-path control, the first optical package configured to guide and focus light from the LED onto the sample. The microfluidic device includes a tethered control substance. In response to a substance within the sample being associated with, and attaching to, the tethered control, the sample emits light. The second optical package includes a photo sensor, a second optical device, and a second light-path control, the second optical package configured to guide and focus the light emitted from the sample onto the photo sensor.

Portable light generation and detection system

Disclosed herein are biosensors and methods for making and using the same. In one embodiment, the sensor for detecting an analyte comprises: a substrate, recognition elements specific for the analyte, an excitation source, a detector, a chamber located between the substrate and the excitation source and between the substrate and the detector, and an emission filter. The recognition elements are tethered to the substrate such that the recognition elements can be exposed to a sample. The excitation source is capable of emitting a first light having a first light peak intensity at a first wavelength, wherein the first light can excite a luminophore to emit a second light when the recognition elements interact with the analyte. The detector is capable of detecting the second light emitted by the luminophore. The emission filter is capable of filtering in a band gap that includes the first light peak intensity.

DNA biosensor and methods for making and using the same

A system and method for multimode imaging of at least one sample is disclosed. The system includes at least one light source; an optical system selected responsive to a mode of operation of the imaging system; and a detector capable of selective reading of pixels. The at least one sample is moved elative to the optical system using a sample movement technique selected from the group consisting of step sample moving and continuous sample moving. The method includes the steps of (1) selecting a mode of operation for the imaging system; (2) transmitting light from at least one light source through an optical system selected in response to the mode of operation for the imaging system; (3) moving the at least one sample relative to the optical system using a sample movement technique selected from the group consisting of step sample moving and continuous sample moving; and (4) selectively reading pixels with a detector.

Growing community of inventors

Niskayuna, NY, United States of America

Eugene Barash