Nippon Sheet Glass Company, Limited

Hitachi Shipbuilding and Engineering Co., Ltd.

Other

Etsuo Ogino

Toshiaki Anzaki

Daisuke Arai

Terufusa Kunisada

Masahiro Ikadai

Yasunori Taninaka

Kazuo Harada

Kenji Mori

Kazuhiro Doushita

Hiroyuki Inomata

Yoshifumi Kijima

Tetsuro Kawahara

Takayuki Toyoshima

Kazuhiko Fujimaki

Ayako Soejima

Nobuo Yoshii

Koji Nakanishi

Masaru Tanaka

Maki Nakamura

Toshiaki Mizuno

Tetsuro Yoshii

Toshiyuki Sakemi

Hiroaki Tada

Shiro Kobayashi

Yuichi Aoki

Takeshi Nakanishi

Chihiro Sakai

Toshio Tsuno

Katsuhisa Enjoji

Nobuyuki Yoshida

Shunji Wada

Toshitaka Shigeoka

Kouji Nakanishi

Minoru Matsumoto

A surface of a glass plate is coated with a first n-type semiconductor film which is a 50 nm-thick niobium oxide film as a primer layer. The primer layer is coated with a 250 nm-thick photocatalyst film comprising titanium oxide. Thus, an article having a photocatalytically active surface is obtained. The two coating films can be formed by sputtering. The first n-type semiconductor film as the primer layer is selected so as to have a larger energy band gap than the titanium oxide. Due to this constitution, more holes are generated near the film surface. This article can be free from the problem of conventional titanium oxide films having photocatalytic activity that it is difficult to generate many surface holes contributing to photocatalytic activity, because electrons and holes generated by charge separation recombine within the film, making it impossible to effectively heighten catalytic activity.

Article having photocatalytic activity

A substrate for reflection type liquid crystal display elements is provided, which has a multilayer dielectric film (reflective mirror) which can have fewer layers than according to the conventional art and can thus be formed in a shorter time, and which can stably obtain an optical characteristic of a desired flatness across the visible region, and moreover can prevent the occurrence of coloring due to reflection. The reflective mirror is formed on top of a transparent substrate, and is comprised of a predetermined number of high-refractive-index first transparent films and low-refractive-index second transparent films laminated alternately on the transparent substrate. Either or both of the first transparent films and the second transparent films are arranged such that the film thickness thereof increases progressively or decreases progressively with distance from the transparent substrate.

Substrate for reflection type liquid crystal display element

The prevent invention improves the film thickness distribution in the direction of revolution of substrates by a simple manner in a method for forming coating films, wherein a evaporating source is disposed at a predetermined distance from substrates and when a coating film material is applied from the evaporating source onto the substrate surfaces while revolving the substrates coating films are formed on the substrate surfaces in a condition where the radius of curvature of the substrates obtained by bending the substrates within the elasticity range is made equal to the radius of revolution of the substrates

Method and device for forming film

A substrate for liquid crystal display elements is provided, which can meet a variety of required optical characteristics and, at the same time, improve the utilization factor of light without the possibility of inducing a signal delay. A predetermined number of pairs of a transparent film having a high refractive index and a transparent film having a low refractive index, each composed of a dielectric material, are stacked on a transparent substrate. The high refractive index transparent film and the low refractive index transparent film have refractive indices of light of not less than 1.8 and not more than 1.5 at a wavelength of 550 nm, respectively. The predetermined number of pairs is 1 or more, and the high refractive index transparent film and the low refractive index transparent film each have a film thickness thereof set to such a value that the light reflectance in a visible light region of each of the transparent films is within a range of 5-95%.

Substrate for liquid crystal display elements

A solar-shading light-transmissive panel has a light-transmissive sheet, an absorbing layer disposed on said light-transmissive sheet, a first transparent dielectric layer disposed on said absorbing layer, an Ag-rich layer comprising Ag as a main component disposed on said first transparent dielectric layer, and a second transparent dielectric layer disposed on said Ag-rich layer. The solar-shading light-transmissive panel, which basically has the four layers and can be manufactured relatively inexpensively, has an ornamentally excellent appearance, a relatively high solar-shalding capability, and a relatively high visible light transmittance.

Solar-shading light-transmissive panel and solar-shading multi-layer light-transmissive panel using same

A method of film deposition is disclosed, which eliminates the conventional problem that a coating film having a component concentration gradient in the thickness direction and thus having a boundary with a compositional gradient or a coating film in which two or more components coexist as a mixture thereof cannot be stably obtained by sputtering. In the method, two planar cathodes are closely arranged as a pair, and a voltage is applied thereto while alternately inverting the polarities thereof so that when a target A bonded to one of the cathodes is used as a negative electrode, then a target B bonded to the other cathode and differing to the target A in component is used as a positive electrode. The targets A and B are simultaneously bombarded with positive ions while passing a substrate in front of the targets so as to cross the cathodes. Thus, a coating film having a boundary with a compositional gradient in the thickness direction or a coating film having a two-layer structure composed of a layer of ingredient A and a layer of ingredient B is deposited by sputtering through one-direction conveyance.

Method of film deposition on substrate surface and substrate produced by the method

A light transmitting electromagnetic wave filter comprising a transparent and a light transmitting electromagnetic wave shield film having a laminate structure composed of 2n&plus;1 (n&gE;1) layers in which at least two dielectric layers and at least one silver layer are alternately laminated, with each other with the dielectric layer being the first to be provided on the transparent substrate, wherein at least one of the dielectric layers is an antistatic metal oxide layer having a refractive index of 1.6 to 2.7 at a wavelength of 550 nm, which is preferably formed by sputtering using a metal oxide, e.g., tin-containing indium oxide, as a target in an atmosphere having a reduced oxygen content. The electromagnetic wave filter has a high visible light transmission and a low near infrared transmission, is free from pin holes or contamination, and exhibits high durability against moist heat, etc.

Light transmitting electromagnetic wave filter and process for producing the same

A transparent touch panel substrate comprising a transparent substrate and deposited thereon a transparent conductive metal oxide film which contains zinc, indium, and tin as metallic elements and is soluble in acids. The transparent conductive metal oxide film preferably contains zinc in an amount of from 40 to 65 atomic % based on all metals and contains indium in an amount of from 0.25 to 1.3 times the amount of tin on an atomic basis. The film preferably has a thickness of from 100 to 160 nm. Unlike the conventional substrate for resistive film type transparent touch panels which comprises a glass plate coated with a transparent conductive ITO film, the touch panel substrate of the invention combines three properties: high light transmittance; ease of processing in forming a transparent electrode by acid etching; and the transparent conductive film has a moderate sheet resistance of from 500 to 5,000&OHgr;. It therefore realizes a touch panel which combines the three functions of having satisfactory display quality, being of the power-saving type, and enabling touch switch operations to be conducted without fail.

Touch panel substrate having transparent conductive film

A conductive sinter obtained from a mixture of titanium oxide particles and 2.5% by weight niobium oxide particles is used as a target in direct current sputtering to form a photocatalytically active film mainly comprising titanium oxide on a glass substrate. The target has a surface resistance of 500 &OHgr;/&square; or lower and the sputtering is conducted while heating the substrate at 230&deg; C. The photocatalytically active film is based on an amorphous matrix. This process is free from problems of a conventional process in which a photocatalytically active titanium oxide film is deposited by reactive sputtering using titanium metal as a target. The problems are that the substrate needs to be heated to 350&deg; C. or higher and that the deposited film does not have high photocatalytic activity.

Multilayer structure and process for producing the same

A sunlight shielding translucent glass panel has a transparent glass sheet, an absorbing layer disposed on the transparent glass sheet, and transparent dielectric films and mainly Ag films that are alternately arranged on the absorbing layer.

Sunlight shielding translucent glass panel and sunlight shielding translucent multilayer glass panel assembly

A correction mechanism including a magnetic body ( ) is placed at a position between a vacuum chamber ( ) and a steering coil ( ) and where line of magnetic force generated from the steering coil is present, to correct torsion and/or bias of a plasma beam.

Vacuum film growth apparatus

A method of manufacturing a substrate for displays is provided, which can easily control the surface electrical resistance of the anti-electrification film formed on a surface of the substrate, and a substrate for displays manufactured by the same method. The film is formed by preparing a target from a metal oxide, and forming a thin film of a metal oxynitride on a surface of the substrate by sputtering using the target in an atmosphere of a mixture gas of an inert gas and nitrogen, a mixing ratio of the inert gas and nitrogen in the atmosphere being adjusted such that the thin film has a desired surface electrical resistance.

Method of manufacturing a substrate for displays and a substrate for displays manufactured by same

Sputtering method and apparatus for forming a coating on both sides of a flat substrate or on the entire surface of a bulky substrate without involving rotation of the substrate. At least one pair of sputtering cathodes each having a target attached thereto are arranged in a film-forming chamber capable of controlling a vacuum atmosphere with their target sides facing each other, and a substrate is disposed in front of the targets. A voltage is applied to the sputtering cathodes in such a manner that the polarity alternates between the sputtering cathodes making the pair to induce a glow discharge between the sputtering cathodes. The target on each sputtering cathode is thereby sputtered and deposited on the substrate.

Method for forming coating on substrate and sputtering apparatus used for the method

An electromagnetic wave filter for a plasma display panel which is effective in preventing incorrect actions of a remote control of appliances, comprising a transparent substrate, a light transmitting electromagnetic wave shield film, and a resin protective film, wherein the electromagnetic wave shield film is a 7-layered laminate in which a dielectric layer and a metal layer containing silver as the principal ingredient are laminated alternately with the dielectric layer being the first to be provided on the transparent substrate, the dielectric layer has a refractive index of 1.6 to 2.8 at 550 nm, and the metal layer containing silver as the principal ingredient contains 0.1 atomic % or more and less than 0.5 atomic % of palladium based on silver and has a thickness of 5 to 25 nm, whereby the electromagnetic wave shield film has a sheet resistance of 3 &OHgr;/&square; or lower and a near infrared transmission of 20% or lower at 850 nm.

Electromagnetic wave filter for plasma display panel

A face panel for a cathode-ray tube is coated with an antireflection film by forming, on the outer surface thereof in this order, a 44.9 nm-thick praseodymium titanate film as a first layer, a 4.9 nm-thick film of a nickel-iron alloy as a second layer, a 53.4 nm-thick praseodymium titanate film as a third layer, a 3.9 nm-thick film of a nickel-iron alloy as a fourth layer, a 20.6 nm-thick praseodymium titanate film as a fifth layer, and an 84.7 nm-thick magnesium fluoride film as a sixth layer. This coated face panel is free from the problem that conventional cathode-ray tube face panels coated on the outer surface with an antireflection film comprising superposed metal films and transparent dielectric films make the cathode-ray tubes exhibit double images although effective in diminishing the reflection of external light on the surface of the cathode-ray tubes and in enhancing display contrast. The cathode-ray tube using the face panel coated with the specific antireflection film does not exhibit double images, is prevented from suffering static buildup on its surface or from reflecting external light thereon, and can attain higher image contrast.

Growing community of inventors

Osaka, Japan

Etsuo Ogino