Mitsubishi Chemical Corporation

Etsuko Hino

Toshiyuki Urano

Shingo Ikeda

Akihisa Murata

Shin Kawana

Takumi Nagao

Mitsuru Sasaki

Takaaki Niinomi

Toshiaki Yokoo

Takeshi Ohmori

Jun Fujita

Koji Mori

A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing a thermally decomposable material which decomposes by the action of heat generated by the photo-thermal conversion material upon absorption of light from the image exposure light source, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.

Method for forming a positive image

A positive photosensitive composition comprising an alkali-soluble resin having phenolic hydroxyl groups (a) and a photo-thermal conversion material (b), and not containing a quinonediazide compound, which contains an alkali-soluble resin having phenolic hydroxyl groups, of which at least some are esterified (a-1).

Positive photosensitive composition, positive photosensitive lithographic printing plate and method for forming a positive image

A photopolymerizable composition comprising (A) an ethylenically unsaturated compound, (B) a cyanine dye and (C) a photopolymerization initiator, wherein the cyanine dye of component (B) is a cyanine dye of a structure having hetero atoms connected via a polymethine chain, and the polymethine chain has at least one substituent of the following formula (.alpha.): ##STR1## wherein Q.sup.1 and Q.sup.2 are optional substituents, which may be connected to form a ring.

Photopolymerizable composition, photopolymerizable lithographic printing

A positive photosensitive composition comprising an alkali-soluble organic high molecular substance having phenolic hydroxyl groups and an acid color forming dye.

Positive photosensitive composition, photosensitive lithographic

A radiation sensitive composition comprising a film-forming resin and a bis(sulfonyl)diazomethane compound of the following formula (1) or (2): ##STR1## wherein each of R.sup.1 and R.sup.3 is a linear, branched or cyclic alkyl group which may be substituted, R.sup.2 is a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group, and each of R.sup.4, R.sup.5 and R.sup.6 which are independent of one another, is a linear, branched or cyclic alkyl group which may be substituted, a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group.

Radiation sensitive composition

A photopolymerizable composition for a color filter, which comprises a compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator, and a red, green or blue colorant and which, when formed into a coating film having a dried film thickness of at most 1 .mu.m, has an optical density of at least 1.1.

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Yokohama, Japan

Etsuko Hino