Kla Corporation

Etay Lavert

Amnon Manassen

Avner Safrani

Dimitry Sanko

Vladimir Levinski

Raviv Yohanan

Avi Abramov

Eitan Hajaj

Yossi Simon

Diana Shaphirov

Shlomo Eisenbach

Michael Shentcis

Ariel Hildesheim

Yoav Grauer

Isaac Salib

Iftach Nir

An optical metrology tool may include one or more illumination sources to generate illumination having wavelengths both within a short-wave infrared (SWIR) spectral range and outside the SWIR spectral range, illumination optics configured to direct the illumination to a sample, a first imaging channel including a first detector configured to image the sample based on a first wavelength range including at least some wavelengths in the SWIR spectral range, a second imaging channel including a second detector configured to image the sample based on a second wavelength range including at least some wavelengths outside the SWIR spectral range, and a controller. The controller may receive first images of the sample from the first detector, receive second images of the sample from the second detector, and generate an optical metrology measurement of the sample based on the first and second images.

Optical metrology utilizing short-wave infrared wavelengths

A metrology system includes one or more through-focus imaging metrology sub-systems communicatively coupled to a controller having one or more processors configured to receive a plurality of training images captured at one or more focal positions. The one or more processors may generate a machine learning classifier based on the plurality of training images. The one or more processors may receive one or more target feature selections for one or more target overlay measurements corresponding to one or more target features. The one or more processors may determine one or more target focal positions based on the one or more target feature selections using the machine learning classifier. The one or more processors may receive one or more target images captured at the one or more target focal positions, the target images including the one or more target features of the target specimen, and determine overlay based thereon.

System and method for determining target feature focus in image-based overlay metrology

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Milpitas, CA, United States of America

Etay Lavert