Kla Tencor Corporation

Kla Corporation

Etay Lavert

Tal Marciano

Vincent Immer

Amnon Manassen

Yoram Uziel

Daria Negri

Ohad Bachar

Liran Yerushalmi

Yossi Simon

Nir Ben David

A system and method for generating a quality parameter value of a semiconductor device wafer (SDW), during fabrication thereof, the method including designating a plurality of measurement site sets (MSSs) on the SDW, each of the MSSs including a first measurement-orientation site (FMS) and a second measurement-orientation site (SMS), the FMS and the SMS being different measurement sites on the SDW, generating a first measurement-orientation quality parameter dataset (FMQPD) by measuring features formed within each the FMS of at least one of the MSSs in a first measurement orientation, generating a second measurement-orientation quality parameter dataset (SMQPD) by measuring features formed within each the SMS of the at least one of the MSSs in a second measurement orientation and generating at least one tool-induced-shift (TIS)-ameliorated quality parameter value (TAQPV), at least partially based on the FMQPD and the SMQPD.

Systems and methods for improved metrology for semiconductor device wafers

A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.

Expediting spectral measurement in semiconductor device fabrication

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Givat Ella, Israel

Etay Lavert