Mapper Lithography IP B.v.

Asml Netherlands B.v.

Erwin Slot

Vincent Sylvester Kuiper

Guido De Boer

Marcel Nicolaas Jacobus Van Kervinck

Hendrik Jan De Jong

Pieter Kruit

Tijs Frans Teepen

Marco Jan-Jaco Wieland

Stijn Willem Herman Karel Steenbrink

Niels Vergeer

Paul Ijmert Scheffers

Jan Andries Meijer

Albertus Victor Gerardus Mangnus

Marco Jan Jaco Wieland

Stijn Willem Karel Herman Steenbrink

Stijin Willem Herman Karel Steenbrink

A detector for use in a charged particle device for an assessment tool to detect signal particles from a sample, the detector including a substrate, the substrate including: a semiconductor element configured to detect signal particles above a first energy threshold; and a charge-based element configured to detect signal particles below a second energy threshold.

Charged particle device, detector, and methods

A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

Beam grid layout

A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system () for projecting a plurality of charged particle beamlets () onto the surface of the substrate; a chuck () moveable with respect to the projection system; a beamlet measurement sensor (i.a.i.e.,) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface () for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (), the position mark measurement system comprising an alignment sensor (). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion () for accommodating the surface of the beamlet measurement sensor, and a position mark portion () for accommodating the position mark.

Charged particle lithography system with alignment sensor and beam measurement sensor

Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which

Lithography system, sensor and measuring method

An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

Apparatus for transferring a substrate in a lithography system

A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system () for projecting a plurality of charged particle beamlets () onto the surface of the substrate; a chuck () moveable with respect to the projection system; a beamlet measurement sensor (i.a.) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface () for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (), the position mark measurement system comprising an alignment sensor (). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion () for accommodating the surface of the beamlet measurement sensor, and a position mark portion () for accommodating the position mark.

The invention relates to a clustered substrate processing system comprising a plurality of lithography elements. Each lithography element is arranged for independent exposure of substrates according to pattern data, and comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit, and a data network arranged for communication of data logging information from the lithography subsystems to at least one data network hub, the lithography subsystems arranged to transmit data logging information to the data network hub and the data hub arranged for receiving and storing the data logging information. The system further comprises a cluster front-end for interface to an operator or host system.

Network architecture for lithography machine cluster

An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.

A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N&#x2212;1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit.

Method of processing a substrate in a lithography system

The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area.

Growing community of inventors

Zoetermeer, Netherlands

Erwin Slot