Carl Zeiss Meditec Ag

Carl-zeiss-smt Ag

Carl-zeiss-stiftung Trading As Carl Zeiss

Erwin Gaber

Toralf Gruner

Hubert Holderer

Christoph Zaczek

Christian Beder

Diana Tonova

Michael Sundermann

Ulrich Weber

Christian Wagner

Michael Gerhard

Alexander Kohl

Armin Schoeppach

Jochen Becker

Winfried M Kaiser

Erich Merz

Rudolf Von B&uuml;nau

Reiner Garreis

Arie Cornelis Scheiberlich

Mike Meehan

Chris Reed

Dragos Pariza

A method for producing an optical element having a main body with a first side surface, which has a first optical coating, and at least one second side surface, which is not plane-parallel to the first side surface and has a second optical coating, is proposed. The method includes the steps of: determining the stress induced in the optical element by the first optical coating of the first side surface; determining a counter-stress, so that the resultant overall stress induced in the optical element is as small as possible; determining the second optical coating while taking into account the determined counter-stress and the optical parameters of the second optical coating; applying the first optical coating on the first side surface; and, applying the second optical coating on the at least one second side surface.

Optical element and method of making an optical element

The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.

Device for holding a beam splitter element

A projection exposure system for microlithography that has a catadioptric projection objective and a light source is claimed. The projection objective has at least one mirror and at least one lens that are composed of specified materials. Also the positions of the mirror and of the lens within the projection objective are also specified. The material and position are specified in such a way that imaging changes in the projection objective that are due to illumination-induced change in the reflecting surface of the mirror counteract illumination-induced imaging changes in the lens. Illumination-induced imaging changes in the entire projection objective are reduced in this way.

Projection exposure system

An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount ( ), and actuators ( ) which engage on the optical element ( ) at least approximately perpendicularly to the optical axis. The actuators ( ) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element ( ), for the production of bendings which take place substantially without thickness changes.

Optical system, especially a projection light facility for microlithography

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Heidenheim, Germany

Erwin Gaber