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Censor Patent- Und Versuchs-anstalt

Perkin-elmer Censor Anstalt

Balzers Patent Und Beteiligungs Ag

Ernst W Lobach

Werner Tabarelli

Herbert E Mayer

Interferometer gas flow system

To adjust a device for the projection copying of masks on a semiconductor substrate, adjustment marks are illuminated with wideband adjustment light in order to make variations in the intensity of the reflected signal in the area of a mark field. The color defect created by the wideband nature of the adjustment light is eliminated by an achromatization device which covers only a part of the total picture field which contains the adjustment marks.

Device for the projection copying of masks onto a workpiece

To adjust a device for the projection copying of masks on a semiconductor substrate, adjustment marks are illuminated with wideband adjustment light in order to eliminate variations in the intensity of the reflected signal in the area of a mark field. The color defect created by the wideband nature of the ajustment light is determined by spectroscopic means and taken into account when making the adjustment.

Device for the projection copying of masks

In order to determine magnification and/or alignment in a device for the projection printing of a pattern on a mask onto a substrate an adjustment plate insertable below the projection lens is provided, said adjustment plate being provided with light-transmitting zones conjugated with recesses in the mask in respect of the projection lens in the exposure light, photometer means being arranged below said light-transmitting zones.

Device for the projection printing of masks into a workpiece

Using a photolithographic projection apparatus a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

Apparatus for the photolithographic manufacture of integrated circuit

Process for transferring a pattern onto a semiconductor disk

Process and arrangement for copying masks on a workpiece with

An arrangement for projection copying of masks onto a workpiece, in particular onto a semiconductor substrate for producing integrated circuits, wherein the images of the patterns of the masks are formed by a projection lens on a photosensitive layer on the workpiece. The projection lens is completely corrected at the exposure wavelength used, and alignment patterns of the mask are aligned relative to adjustment marks on the workpiece, after images of the alignment pattern and the adjustment mark have been formed in the same plane, with adjustment exposure, by the projection lens and possibly an auxiliary optical means. The formation of the images of the adjustment marks in the plane of the alignment pattern or the alignment pattern in the plane of the adjustment marks is effected by means of the projection lens and possibly the auxiliary optical means, with an image defect which changes points to lines extending sagittally or meridionally with respect to the optical axis, and that the adjustment marks and the alignment pattern include lines which correspondingly extend sagittally and meridionally respectively with respect to the optical axis.

Arrangement for projection copying masks on to a work piece

In a photolithographic method for the manufacture of integrated circuits a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

Photolithographic method for the manufacture of integrated circuits

A vacuum metering valve comprises a housing having an inlet and a discharge space from the inlet with a flow passage between the inlet and outlet having a valve seat with a valve member which is mounted in the housing for movement toward and away from the seat. The construction includes mechanical means for adjusting the position of the valve member in relation to the seat and in addition temperature control means are provided for varying the position in reference to the seat in accordance with temperature variations. Temperature variations are produced by suitable means for heating and cooling an auxiliary member which is disposed for example between a mechanical adjustment device and the valve member.

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Eschen, Liechtenstein

Ernst W Lobach