Asml Netherlands B.v.

Asml Holding N.v.

Erik Theodorus Maria Bijlaart

Christiaan Alexander Hoogendam

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Jeroen Johannes Sophia Maria Mertens

Helmar Van Santen

Aleksey Yurievich Kolesnychenko

Sjoerd Nicolaas Lambertus Donders

Joeri Lof

Alexander Straaijer

Klaus Simon

Timotheus Franciscus Sengers

Joannes Theodoor De Smit

Hendricus Johannes Maria Meijer

Hans Butler

Roelof Aeilko Siebrand Ritsema

Frank Van Schaik

Patricius Aloysius Jacobus Tinnemans

Bernardus Antonius Slaghekke

Arie Jeffrey Den Boef

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Mark Kroon

Hans Jansen

Antonius Theodorus Anna Maria Derksen

Jacobus Johannus Leonardus Hendricus Verspay

Harry Sewell

Edwin Johan Buis

Louis John Markoya

Arnoud Cornelis Wassink

Alexander Matthijs Struycken

Diane Czop McCafferty

Paul Peter Anna Antonius Brom

Ralph Joseph Meijers

Aleksey Yurievich Kolensnychenko

Roelof Aeilko Siebranc Ritsema

JJSM Mertens

PAJ Tinnemans

Roelof Aeiko Siebrand Ritsema

Sjoerd Nicolaas Lamburtus Donders

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid

An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

Lithographic apparatus and device manufacturing method involving a member and a fluid opening

An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.

Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap

Lithographic apparatus

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Growing community of inventors

Rosmalen, Netherlands

Erik Theodorus Maria Bijlaart