Fei Comapny

Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Fei Cmnpany

Philips Gmbh

Erik René Kieft

Petrus Henricus Antonius Mutsaers

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Pieter Kruit

Alexander Henstra

Lucas Henricus Johannes Stevens

Vladimir Mihailovitch Krivtsun

Konstantin Nikolaevitch Koshelev

Olav Waldemar Vladimir Frijns

Erik Martinus Hubertus Petrus Van Dijk

Bart Pierre Antoine Jozef Hoornaert

Sander Hans Denissen

Ali Mohammadi-Gheidari

Marco Verstege

Otger Jan Luiten

Vladimir Vital'Evitch Ivanov

Robert Rafilevitch Gayazov

Fredericus Bernardus Kiewiet

Wouter Verhoeven

Jasper Frans Mathijs Van Rens

Adam Christopher Lassise

Edgar Jan Dirk Vredenbregt

Walter Van Dijk

Bastiaan Lambertus Martinus Hendriksen

Yurii Victorovitch Sidelkov

Vsevolod Grigorevitch Koloshnikov

Michael Grass

Dick Dijkkamp

The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen; a source for producing a beam of charged particles; and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and directing said plurality of charged particle beamlets onto said specimen. According to the disclosure, the illuminator comprises a multi-aperture lens plate having a plurality of apertures for defining the corresponding plurality of charged particle beamlets; as well as at least a first electrode for generating an electrical field at a surface of the multi-aperture lens plate. The apertures in said multi-aperture lens plate have a noncircular cross-sectional shape to correct for neighbouring aperture induced aberrations. This allows for decreased spot size, and with this imaging resolution of the device is increased.

Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets

Methods and systems for examining a dynamic specimen using a Transmission Charged Particle Microscope are disclosed. An example method includes sparsifying a beam of charged particles to produce at detector an image of a sample comprising a distribution of sub-images that are mutually isolated from one another at least along an elected scan path, and using a scanning assembly to cause relative motion of said image and said detector along said scan path during a time interval &#x394;t so as to smear out each sub-image into a detection streak on said detector, each such streak capturing temporal evolution of its associated sub-image during said time interval &#x394;t.

Studying dynamic specimens in a transmission charged particle microscope

A method of using a Charged Particle Microscope, comprising:

Studying dynamic specimen behavior in a charged-particle microscope

A method of investigating a specimen using charged particle microscopy, comprising the following steps:

Time-resolved charged particle microscopy

An apparatus for performing charged particle spectroscopy, comprising:

Time-of-flight charged particle spectroscopy

A controller and a related method of controlling a collimator. The controller operates to select a collimator setting for collimator of an x-ray imager for acquiring an image of a ROI in a patient. The controller operates to select the collimator setting to optimize the patient dosage in respect of primary radiation and secondary radiation dosage of medical staff. A position detector supplies to the controller a current position of a person relative to a patient. Based on said supplied position, the controller's configured to perform an optimization procedure that takes into account the staff dosage in respect of the secondary radiation dosage to reduce the secondary radiation dosage.

Doctor aware automatic collimation

The invention relates to a charged-particle microscope comprising The beam pulsing device comprises a unitary resonant cavity disposed about a particle-optical axis and has an entrance aperture and an exit aperture for the beam. The resonant cavity is configured to simultaneously produce a first oscillatory deflection of the beam at a first frequency in a first direction and a second oscillatory deflection of the beam at a second, different frequency in a second, different direction. The resonant cavity may have an elongated (e.g. rectangular or elliptical) cross-section, with a long axis parallel to said first direction and a short axis parallel to said second direction.

Beam pulsing device for use in charged-particle microscopy

A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.

Radiation source, lithographic apparatus and device manufacturing method

Growing community of inventors

Eindhoven, Netherlands

Erik René Kieft