Asml Netherlands B.v.

Erik Leonardus Ham

Johannes Hubertus Josephina Moors

Gert-Jan Heerens

Hendricus Johannes Maria Meijer

Hans Meiling

Erik Roelof Loopstra

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Robert Gabriël Maria Lansbergen

Bastiaan Matthias Mertens

Henri Gerard Cato Werij

Sjoerd Nicolaas Lambertus Donders

Vadim Yevgenyevich Banine

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Paulus Martinus Maria Liebregts

Hendrik Antony Johannes Neerhof

Hugo Matthieu Visser

Marco Le Kluse

Hubert Adriaan Van Mierlo

Jan Hopman

Johannes Adrianus Petrus Leijtens

Ellart Alexander Meijer

Gart-Jan Heerens

Bastiaan Lambertus Wilhemus Marinus Van De Ven

Ellard Alexander Meijer

Gerrit-Jan Heerens

The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.

Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus

A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.

Lithographic apparatus and patterning device transport

A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

Lithographic apparatus and device manufacturing method

A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.

Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby

According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.

The invention relates to a lithographic apparatus including an illumination system for providing a projection beam of radiation, a support structure for supporting patterning means, the patterning means serving to impart the projection beam with a pattern in its cross-section, a dust-right storage container defining a storage space for storing patterning structures, wherein the storage container is arranged to be coupled with a transfer container such that the transfer container for exchanging patterning structures between the transfer container and the lithographic apparatus through a closeable passage between the transfer container and the storage container, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. Furthermore, the invention relates to a method of using such an apparatus.

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby

A method for transferring one or more substrates or masks in a storage box to an apparatus for handling, processing or using the substrates or masks or vice versa, the storage box including a cover having an openable cover part. The method includes providing the storage box onto an openable wall part of a wall of an enclosed protective environment of the apparatus such that the openable cover part overlaps the openable wall part, the protective environment being adapted to be filled with an inert gas or to be evacuated; opening the openable cover part and the openable wall part, whereby the cover of the storage box forms part of the wall of the protective environment and an inside of the storage box becomes part of the protective environment; and transferring at least one of the substrates or masks from an inside space of the storage box to an inside space of the protective environment, or vice versa.

Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method

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Rotterdam, Netherlands

Erik Leonardus Ham