Viratec Thin Films, Inc.

Other

Tru Vue, Inc.

Erik J Bjornard

Debra M Steffenhagen

Eric William Kurman

Eric R Dickey

William A Meredith, Jr

Clifford L Taylor

David E Stevenson

Geoffrey H Humberstone

Kim D Powers

Kelly R Clayton

Charles C Gammans

R Russel Austin

James J Hoffmann

Jeffrey J Hoffman

Clifford E Taylor

Michael J Valiska

David A Shogren

A multilayer antireflection coating for a temperature sensitive substrate such as plastic. One layer is a DC reactively sputtered metal oxide which may be deposited quickly and without imparting a large amount of heat to the substrate. Another layer has a refractive index lower than the substrate.

Antireflection coating for a temperature sensitive substrate

A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings.

System for evaluating thin film coatings

A method, apparatus and carrier for coating a CRT screen after assembly. The method and apparatus includes isolating a surface portion of the CRT to be coated from the remaining surface to prevent or minimize coating problems resulting from outgassing or difficulty in controlling coating process parameters and to isolate noncompatible components from the deposition environment.

Method and apparatus for thin film coating an article

A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings for later objects passing through the system.

A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.

Shielding for arc suppression in rotating magnetron sputtering systems

A method and apparatus for cleaning a substrate in preparation for thin film coating. The invention involves cleaning the substrate in a cleaning chamber under controlled conditions by a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium.

Method and apparatus for cleaning substrates in preparation for

A method and apparatus for coating a CRT screen after assembly. The method and apparatus includes isolating a surface portion of the CRT to be coated from the remaining surface to prevent or minimize coating problems resulting from outgassing and to isolate noncompatible components from the deposition environment.

An antireflection coating for a substrate including four layers and having optimized photopic reflectance and optimized for deposition by sputtering. The first layer (the layer farthest from the substrate) has a refractive index less than the refractive index of the substrate and a thickness of about one-quarter wavelength. The second layer (the layer adjacent the first layer) has an refractive index greater than about 2.2 and a thickness of about a half wavelength. The third layer has refractive index less than that of the second layer. The fourth layer (the layer adjacent the substrate) has a refractive index less than about 2.0 and greater than that of the third layer. The combined thickness of the third and fourth layers is less than about a quarter wavelength. The first and third layers may include silicon dioxide. The second layer may include titanium dioxide or niobium oxide. The fourth layer may include indium oxide, tin oxide, indium tin oxide, or zinc oxide.

Four-layer antireflection coating for deposition in in-like DC

A coating for an article comprising layers of nitrides of certain transition metals to provide an electrically-conductive, light-attenuating, antireflection surface.

Electrically-conductive, light-attenuating antireflection coating

An apparatus for rotatably mounting a cylindrical magnetron in a vacuum chamber. The apparatus includes a bearing housing having one end extending into the vacuum chamber with the other end located outside the chamber. A drive shaft is rotatably mounted in the bearing housing. Each end of the drive shaft extends beyond the housing. The cylindrical magnetron is attached to the end of the drive shaft inside the chamber. A vacuum seal is located in the bearing housing for sealing the drive shaft to the housing. The drive shaft is mounted in the housing such that the load of the magnetron is not transferred to the vacuum seal.

Cantilever mount for rotating cylindrical magnetrons

A mask arrangement is located between the cathode and substrate in an in-line sputtering system. The relative shape of the mask may be changed from outside the system. Thus, film thickness uniformity can be modified and controlled without interrupting the sputtering process.

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Northfield, MN, United States of America

Erik J Bjornard