Asml Netherlands B.v.

Erik Henricus Egidius Catharina Eummelen

Giovanni Luca Gattobigio

Cornelius Maria Rops

Theodorus Wilhelmus Polet

David Bessems

Han Henricus Aldegonda Lempens

Johannes Cornelis Paulus Melman

Miao Yu

Michel Riepen

Rogier Hendrikus Magdalena Cortie

Koen Cuypers

Jorge Alberto Vieyra Salas

Ruud Olieslagers

Johannes Catharinus Hubertus Mulkens

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Nicolaas Rudolf Kemper

Marco Koert Stavenga

Ronald Van Der Ham

Paulus Martinus Maria Liebregts

Koen Steffens

Richard Moerman

Jimmy Matheus Wilhelmus Van De Winkel

Pieter Mulder

Clemens Johannes Gerardus Van Den Dungen

Patrick Johannes Wilhelmus Spruytenburg

Victor Manuel Blanco Carballo

Artunç Ulucan

Frederik Antonius Van Der Zanden

Marijn Wouters

Marcel Beckers

Laurentius Johannes Adrianus Van Bokhoven

Ferdy Migchelbrink

Cédric Désiré Grouwstra

Gerben Pieterse

Takeshi Kaneko

Gheorghe Tanasa

Danny Maria Hubertus Philips

Christianus Wilhelmus Johannes Berendsen

Pieter Lein Joseph Gunter

Evert Van Vliet

John Maria Bombeeck

Ronald Frank Kox

Nicolaas Franciscus Koppelaars

Petrus Martinus Gerardus Johannes Arts

Christian Gerardus Norbertus Hendricus Marie Cloin

Olga Vladimirovna Elisseeva

Tijmen Wilfred Mathijs Gunther

Frank Debougnoux

Remko Jan Peter Verhees

Sergei Shulepov

Nina Vladimirovna Dziomkina

Yuri Johannes Gabriël Van De Vijver

Arnoldus Johannes Martinus Jozeph Ras

Norbertus Josephus Martinus Van Den Nieuwelaar

Fabrizio Evangelista

Daan Daniel Johannes Antonius Van Sommeren

Bert Dirk Scholten

Jeroen Arnoldus Leonardus Johannes Raaymakers

Harold Sebastiaan Buddenberg

Marcus Johannes Van Der Zanden

Floor Lodewijk Keukens

Stef Marten Johan Janssens

Walter Theodorus Matheus Stals

Sudhir Srivastava

Hendrikus Johannes Schellens

David Merritt Phillips

Theodorus Johannes Antonius Renckens

Adrianus Marinus Wouter Heeren

Bo Lenssen

Casper Roderik De Groot

Michaël Christiaan Van Der Wekken

Wilhelmus Antonius Wernaart

Andre Bernardus Jeunink

Frank Johannes Jacobus Van Boxtel

Bearrach Moest

Marinus Jochemsen

Antonius Johannus Van Der Net

Marco Baragona

Matthias Kruizinga

Daniel Jozef Maria Direcks

Jeroen Gerard Gosen

Anthonie Kuijper

Gregory Martin Mason Corcoran

Pieter Jacob Kramer

Gert-Jan Gerardus Johannes Thomas Brands

Johannes Adrianus Cornelis Maria Pijnenburg

Jan Willem Cromwijk

Johan Franciscus Maria Beckers

Sandra Van Der Graaf

Hermen Folken Pen

Adrianes Johannes Baeten

Hua Li

Francis Fahrni

Maikel Adrianus Cornelis Schepers

Nirupam Banerjee

Ralph Joseph Meijers

Erik Witberg

Federico La Torre

A method is provided for determining surface parameters of a patterning device, comprising the steps of: positioning the patterning device with respect to a path of an exposure radiation beam using a first measurement system, providing the patterning device at a first focal plane of a chromatic lens arranged in a second measurement system, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein the radiation comprises a plurality of wavelengths, determining a position of the illuminated part of the patterning device in a first and second direction, collecting at least a portion of radiation reflected by the patterning device through the chromatic lens, measuring an intensity of the collected portion of radiation as a function of wavelength, to obtain spectral information of the illuminated area, and determining the surface parameters of the patterning device at the determined position from the spectral information.

Measurement system and method for characterizing a patterning device

Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.

Fluid handling system, method and lithographic apparatus

A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.

A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus

An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

Lithography apparatus and a method of manufacturing a device

A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

Fluid handling system and lithographic apparatus

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Lithographic apparatus and a method of operating the apparatus

Lithography apparatus and device manufacturing method

A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.

Process tool and an inspection method

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Fluid handling structure and lithographic apparatus

A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus

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Eindhoven, Netherlands

Erik Henricus Egidius Catharina Eummelen