Carl Zeiss Microscopy Gmbh

Carl Zeiss Multisem Gmbh

Carl Zeiss Nts Gmbh

Erik Essers

Michael Albiez

Stewart Bean

Stefan Meyer

Daniel Kirsten

Jan Horn

Christof Riedesel

Ulrich Bihr

Yanko Sarov

Björn Gamm

Dirk Zeidler

Gerd Ludwig Benner

Stefan Schubert

Michael Trunz

Volker Drexel

Joerg Jacobi

Ingo Mueller

Michael Steigerwald

Arne Thoma

Dieter Schumacher

Wilhelm Bolsinger

A particle beam column generates a particle beam of charged particles, for example electrons or ions, and direct it onto a sample. The particle beam column comprises a multi-aperture stop and a deflection system for selectively steering the particle beam through one of a plurality of apertures provided in the multi-aperture stop. The apertures have different sizes in order to limit the current strength of the particle beam to different values. The particle beam column furthermore comprises a lens for changing the divergence angle of the particle beam upstream of a first stop. The lens can comprise a magnetic lens, which comprises a magnetic core with a plurality of parts, which are electrically insulated from one another and can have substantially different electrical potentials during operation. Some of the parts of the magnetic core can have the same electrical potential as the first stop during operation.

Particle beam column

A particle beam system, such as a multi-beam particle microscope, includes a multi-beam deflection device and a beam stop. The multi-beam deflection device is arranged in the particle-optical beam path downstream of the multi-beam generator and upstream of the beam switch of the particle beam system. The multi-beam deflection device serves collectively blanks a multiplicity of charged individual particle beams. These impinge on a beam stop, which is arranged in the particle-optical beam path level with a site at which a particle beam diameter is reduced or is at a minimum. By way of example, such sites are the cross-over plane of the individual particle beams or an intermediate image plane. Associated methods for operating the particle beam system and associated computer program products are disclosed.

Particle beam system including a multi-beam deflection device and a beam stop, method for operating the particle beam system and associated computer program product

A particle beam device has a particle source, an extraction stop, an anode stop and a beam tube. A driver system of the particle beam device is configured to apply an electrical excitation stop potential to the extraction stop, to apply an electrical anode stop potential, able to be set in a variable manner, to the anode stop and to apply an electrical beam tube potential to the beam tube. A controller of the particle beam device is configured to control the driver system such that a voltage between the extraction stop and the anode stop is able to be set in a variable manner, as a result of which a current strength of the particle beam passing through the aperture of the anode stop is able to be set in a variable manner.

Particle beam device, method for operating the particle beam device and computer program product

Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.

Charged particle optical apparatus for through-the-lens detection of particles

A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.

Multi-beam particle beam system

A particle beam system for examining and processing an object includes an electron beam column and an ion beam column with a common work region, in which an object may be disposed and in which a principal axis of the electron beam column and a principal axis of the ion beam column meet at a coincidence point. The particle beam system further includes a shielding electrode that is disposable between an exit opening of the ion beam column and the coincidence point. The shielding electrode is able to be disposed closer to the coincidence point than the electron beam column.

Particle beam system and method for operating a particle beam system

Charged particle optical apparatus for through-the lens detection of particles

Disclosed is a charged particle optical apparatus, which includes a particle optical arrangement, configured to define a particle beam path for inspecting an object. The object is accommodated in a pressure-controlled interior of a specimen chamber during the inspection of the object. The charged particle optical apparatus further includes a differential pressure module having a differential pressure aperture. A positioning arm is arranged in the specimen chamber for selectively position the differential pressure module within the pressure-controlled interior of the specimen chamber into an operating position in which the particle beam path passes through the differential pressure aperture. The selective positioning includes an advancing movement of the differential pressure module toward the primary particle beam path. The advancing movement is transmitted to the differential pressure module by a track-guided movement of the positioning arm.

Charged particle optical apparatus having a selectively positionable differential pressure module

An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.

Electron beam device

An arrangement for holding a particle beam apparatus such as a transmission electron microscope. The arrangement is sufficient for receiving a good resolution in the area of 1 &#x212b; or less, said arrangement still being under more or less no influence of the environment, in particular, building vibrations. In one embodiment, the arrangement comprises a base structure comprising a plurality of hollow bodies, at least one of said hollow bodies having a first length extension in a first direction, a second length extension in a second direction and a third length extension in a third direction, said first length extension being larger than said second and third length extensions, and wherein a cross section of said at least one of said hollow bodies perpendicular to said first direction is substantially triangular. Due to the hollow body shape, a very stiff structure is provided with a very good eigenfrequency.

Arrangement for holding a particle beam apparatus

An electron microscopy system and an electron microscopy method for detection of time dependencies of secondary electrons generated by primary electrons is provided, in which the primary electron pulses are directed onto a sample surface and electrons emanating from the sample surface are detected, time resolved. To this end the system comprises in particular a cavity resonator. A cavity resonator can also be used to reduce aberrations of focusing lenses.

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Aalen, Germany

Erik Essers